JPS51147967A - Method of controlling spot exposure - Google Patents
Method of controlling spot exposureInfo
- Publication number
- JPS51147967A JPS51147967A JP50072294A JP7229475A JPS51147967A JP S51147967 A JPS51147967 A JP S51147967A JP 50072294 A JP50072294 A JP 50072294A JP 7229475 A JP7229475 A JP 7229475A JP S51147967 A JPS51147967 A JP S51147967A
- Authority
- JP
- Japan
- Prior art keywords
- spot exposure
- controlling spot
- controlling
- exposure
- resembled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50072294A JPS51147967A (en) | 1975-06-14 | 1975-06-14 | Method of controlling spot exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50072294A JPS51147967A (en) | 1975-06-14 | 1975-06-14 | Method of controlling spot exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51147967A true JPS51147967A (en) | 1976-12-18 |
| JPS5719853B2 JPS5719853B2 (show.php) | 1982-04-24 |
Family
ID=13485092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50072294A Granted JPS51147967A (en) | 1975-06-14 | 1975-06-14 | Method of controlling spot exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51147967A (show.php) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5429980A (en) * | 1977-08-10 | 1979-03-06 | Hitachi Ltd | Generation system for pattern |
| JPS5472683A (en) * | 1977-11-01 | 1979-06-11 | Buelow Fred K | Electron beam device and method of using same |
| JPS559433A (en) * | 1978-07-07 | 1980-01-23 | Toshiba Corp | Electron beam exposure device |
| JPS5535010U (show.php) * | 1978-08-26 | 1980-03-06 | ||
| JPS5630727A (en) * | 1979-08-22 | 1981-03-27 | Toshiba Corp | Transmission system of exposure data |
-
1975
- 1975-06-14 JP JP50072294A patent/JPS51147967A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5429980A (en) * | 1977-08-10 | 1979-03-06 | Hitachi Ltd | Generation system for pattern |
| JPS5472683A (en) * | 1977-11-01 | 1979-06-11 | Buelow Fred K | Electron beam device and method of using same |
| JPS559433A (en) * | 1978-07-07 | 1980-01-23 | Toshiba Corp | Electron beam exposure device |
| JPS5535010U (show.php) * | 1978-08-26 | 1980-03-06 | ||
| JPS5630727A (en) * | 1979-08-22 | 1981-03-27 | Toshiba Corp | Transmission system of exposure data |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5719853B2 (show.php) | 1982-04-24 |
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