JPS51147258A - Cvd method and cvd device used - Google Patents

Cvd method and cvd device used

Info

Publication number
JPS51147258A
JPS51147258A JP7081075A JP7081075A JPS51147258A JP S51147258 A JPS51147258 A JP S51147258A JP 7081075 A JP7081075 A JP 7081075A JP 7081075 A JP7081075 A JP 7081075A JP S51147258 A JPS51147258 A JP S51147258A
Authority
JP
Japan
Prior art keywords
cvd
device used
cvd method
cvd device
knowing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7081075A
Other languages
Japanese (ja)
Inventor
Hiromitsu Mishimagi
Hiroshi Kodera
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7081075A priority Critical patent/JPS51147258A/en
Publication of JPS51147258A publication Critical patent/JPS51147258A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To allow easy control of thickness of CVD film by knowing the used quantity of a liquid source.
JP7081075A 1975-06-13 1975-06-13 Cvd method and cvd device used Pending JPS51147258A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7081075A JPS51147258A (en) 1975-06-13 1975-06-13 Cvd method and cvd device used

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7081075A JPS51147258A (en) 1975-06-13 1975-06-13 Cvd method and cvd device used

Publications (1)

Publication Number Publication Date
JPS51147258A true JPS51147258A (en) 1976-12-17

Family

ID=13442283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7081075A Pending JPS51147258A (en) 1975-06-13 1975-06-13 Cvd method and cvd device used

Country Status (1)

Country Link
JP (1) JPS51147258A (en)

Similar Documents

Publication Publication Date Title
NO143178C (en) LIQUID BENEFITS FOR A RUBBALL WITH LIQUID FLOW IN THE FORM OF A THIN FILM.
JPS51114146A (en) A method of forming twist-nematic liquid crystal indicating element
JPS51147258A (en) Cvd method and cvd device used
JPS5215335A (en) Pressure roller fixing device
JPS5235585A (en) Thin film transistor
JPS5341108A (en) Broadcasting device
JPS528272A (en) Damper with stability
JPS51123139A (en) Photographic materials
CA971023A (en) Apparatus for use with self-processing film units
CA1026642A (en) Full bore pipeline valve apparatus
JPS51115288A (en) Method of preparing compound film
JPS51124941A (en) A device for displaying by liquid crystal
JPS52134727A (en) Control system of copier
SU610985A1 (en) Deep-well device for determining liquid composition
JPS524830A (en) Developing method
JPS5248775A (en) Vibration attenuation material
JPS523451A (en) Liquid crystal display device
CA505209A (en) Method for increasing the tear resistance of plastic film
JPS51121273A (en) Charge transfer element
JPS5220863A (en) Inducto type liquid level gauge
JPS52141619A (en) Device applying lubricating liquid to magnetic tape
JPS5232932A (en) Method for forming thin films
JPS5350914A (en) Aural signal transmission device
JPS51115793A (en) Phase calibration apparatus of a decca nevication receiver
JPS5313937A (en) Liquid crystal display device