JPS5114181A - KISHITSUNOHI FUKUHOHO - Google Patents

KISHITSUNOHI FUKUHOHO

Info

Publication number
JPS5114181A
JPS5114181A JP7498975A JP7498975A JPS5114181A JP S5114181 A JPS5114181 A JP S5114181A JP 7498975 A JP7498975 A JP 7498975A JP 7498975 A JP7498975 A JP 7498975A JP S5114181 A JPS5114181 A JP S5114181A
Authority
JP
Japan
Prior art keywords
kishitsunohi
fukuhoho
kishitsunohi fukuhoho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7498975A
Other languages
Japanese (ja)
Inventor
Jei Hiru Ratsuseru
Eru Shureidaa Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airco Inc
Original Assignee
Airco Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Airco Inc filed Critical Airco Inc
Publication of JPS5114181A publication Critical patent/JPS5114181A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
JP7498975A 1974-06-19 1975-06-19 KISHITSUNOHI FUKUHOHO Pending JPS5114181A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48090974A 1974-06-19 1974-06-19

Publications (1)

Publication Number Publication Date
JPS5114181A true JPS5114181A (en) 1976-02-04

Family

ID=23909852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7498975A Pending JPS5114181A (en) 1974-06-19 1975-06-19 KISHITSUNOHI FUKUHOHO

Country Status (3)

Country Link
JP (1) JPS5114181A (en)
DE (1) DE2513813A1 (en)
FR (1) FR2288793A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55104478A (en) * 1979-01-30 1980-08-09 Nippon Kogaku Kk <Nikon> Metallizing apparatus
JPS6096756A (en) * 1983-10-27 1985-05-30 Mitsubishi Electric Corp Vapor deposition apparatus
JPH01108364A (en) * 1987-10-19 1989-04-25 Ishikawajima Harima Heavy Ind Co Ltd Method for supplying material for vapor deposition of vapor source
JP2006504869A (en) * 2002-11-05 2006-02-09 テバ ドュンシッヒトテヒニク ゲーエムベーハー Apparatus and method for depositing a coating material
JP2013007083A (en) * 2011-06-23 2013-01-10 Fujifilm Corp Film forming apparatus
CN105586570A (en) * 2014-11-17 2016-05-18 上海和辉光电有限公司 Radiation source evaporation system and evaporation control method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7398605B2 (en) 2005-02-04 2008-07-15 Eastman Kodak Company Method of feeding particulate material to a heated vaporization surface

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55104478A (en) * 1979-01-30 1980-08-09 Nippon Kogaku Kk <Nikon> Metallizing apparatus
JPS6096756A (en) * 1983-10-27 1985-05-30 Mitsubishi Electric Corp Vapor deposition apparatus
JPH01108364A (en) * 1987-10-19 1989-04-25 Ishikawajima Harima Heavy Ind Co Ltd Method for supplying material for vapor deposition of vapor source
JP2006504869A (en) * 2002-11-05 2006-02-09 テバ ドュンシッヒトテヒニク ゲーエムベーハー Apparatus and method for depositing a coating material
JP2013007083A (en) * 2011-06-23 2013-01-10 Fujifilm Corp Film forming apparatus
CN105586570A (en) * 2014-11-17 2016-05-18 上海和辉光电有限公司 Radiation source evaporation system and evaporation control method

Also Published As

Publication number Publication date
FR2288793A1 (en) 1976-05-21
DE2513813A1 (en) 1976-01-02

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