JPS51140803A - Process and apparatus for melting in zone with temperature gradient - Google Patents
Process and apparatus for melting in zone with temperature gradientInfo
- Publication number
- JPS51140803A JPS51140803A JP51056778A JP5677876A JPS51140803A JP S51140803 A JPS51140803 A JP S51140803A JP 51056778 A JP51056778 A JP 51056778A JP 5677876 A JP5677876 A JP 5677876A JP S51140803 A JPS51140803 A JP S51140803A
- Authority
- JP
- Japan
- Prior art keywords
- melting
- zone
- temperature gradient
- gradient
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/06—Single-crystal growth by zone-melting; Refining by zone-melting the molten zone not extending over the whole cross-section
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/08—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
- C30B13/10—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/24—Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/578,807 US4001047A (en) | 1975-05-19 | 1975-05-19 | Temperature gradient zone melting utilizing infrared radiation |
US05/578,736 US4041278A (en) | 1975-05-19 | 1975-05-19 | Heating apparatus for temperature gradient zone melting |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51140803A true JPS51140803A (en) | 1976-12-04 |
Family
ID=27077566
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51056778A Pending JPS51140803A (en) | 1975-05-19 | 1976-05-19 | Process and apparatus for melting in zone with temperature gradient |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS51140803A (ja) |
DE (1) | DE2621418C2 (ja) |
FR (1) | FR2312112A1 (ja) |
GB (1) | GB1545113A (ja) |
NL (1) | NL7605260A (ja) |
SE (1) | SE416597B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5344487A (en) * | 1976-08-25 | 1978-04-21 | Wacker Chemitronic | Process for preparing large surfaced silicon plate not supported on substrate |
JPS5939711A (ja) * | 1982-08-26 | 1984-03-05 | Ushio Inc | ウエハ−上のアモルファスシリコンもしくは多結晶シリコンをエピタキシアル成長させる方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4257824A (en) * | 1979-07-31 | 1981-03-24 | Bell Telephone Laboratories, Incorporated | Photo-induced temperature gradient zone melting |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2054828B2 (de) * | 1970-11-07 | 1974-06-27 | Applied Materials Technology, Inc. Santa Clara, Calif. (V.St.A.) | Vorrichtung und Verfahren zur Bedampfung von Substraten |
US3897277A (en) * | 1973-10-30 | 1975-07-29 | Gen Electric | High aspect ratio P-N junctions by the thermal gradient zone melting technique |
US3904442A (en) * | 1973-10-30 | 1975-09-09 | Gen Electric | Method of making isolation grids in bodies of semiconductor material |
-
1976
- 1976-05-14 DE DE2621418A patent/DE2621418C2/de not_active Expired
- 1976-05-17 NL NL7605260A patent/NL7605260A/xx not_active Application Discontinuation
- 1976-05-18 GB GB20471/76A patent/GB1545113A/en not_active Expired
- 1976-05-19 JP JP51056778A patent/JPS51140803A/ja active Pending
- 1976-05-19 FR FR7615029A patent/FR2312112A1/fr not_active Withdrawn
- 1976-05-19 SE SE7605678A patent/SE416597B/xx unknown
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5344487A (en) * | 1976-08-25 | 1978-04-21 | Wacker Chemitronic | Process for preparing large surfaced silicon plate not supported on substrate |
JPS577117B2 (ja) * | 1976-08-25 | 1982-02-08 | ||
JPS5939711A (ja) * | 1982-08-26 | 1984-03-05 | Ushio Inc | ウエハ−上のアモルファスシリコンもしくは多結晶シリコンをエピタキシアル成長させる方法 |
Also Published As
Publication number | Publication date |
---|---|
DE2621418A1 (de) | 1976-12-09 |
NL7605260A (nl) | 1976-11-23 |
DE2621418C2 (de) | 1981-12-17 |
SE7605678L (sv) | 1976-11-20 |
SE416597B (sv) | 1981-01-19 |
GB1545113A (en) | 1979-05-02 |
FR2312112A1 (fr) | 1976-12-17 |
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