JPS51137998A - Mechanochemical polishing of precision parts - Google Patents
Mechanochemical polishing of precision partsInfo
- Publication number
- JPS51137998A JPS51137998A JP50062118A JP6211875A JPS51137998A JP S51137998 A JPS51137998 A JP S51137998A JP 50062118 A JP50062118 A JP 50062118A JP 6211875 A JP6211875 A JP 6211875A JP S51137998 A JPS51137998 A JP S51137998A
- Authority
- JP
- Japan
- Prior art keywords
- precision parts
- mechanochemical polishing
- mechanochemical
- polishing
- precision
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
PURPOSE:To make practicable surface treatment which gives a flat,mirroirfaced and flawless surface finish.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50062118A JPS51137998A (en) | 1975-05-24 | 1975-05-24 | Mechanochemical polishing of precision parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50062118A JPS51137998A (en) | 1975-05-24 | 1975-05-24 | Mechanochemical polishing of precision parts |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51137998A true JPS51137998A (en) | 1976-11-29 |
Family
ID=13190811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50062118A Pending JPS51137998A (en) | 1975-05-24 | 1975-05-24 | Mechanochemical polishing of precision parts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51137998A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0234925A (en) * | 1988-04-20 | 1990-02-05 | Fujitsu Ltd | Manufacture of semiconductor device |
EP0439124A2 (en) * | 1990-01-22 | 1991-07-31 | Micron Technology, Inc. | Polishing pad with uniform abrasion |
USRE37997E1 (en) | 1990-01-22 | 2003-02-18 | Micron Technology, Inc. | Polishing pad with controlled abrasion rate |
-
1975
- 1975-05-24 JP JP50062118A patent/JPS51137998A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0234925A (en) * | 1988-04-20 | 1990-02-05 | Fujitsu Ltd | Manufacture of semiconductor device |
EP0439124A2 (en) * | 1990-01-22 | 1991-07-31 | Micron Technology, Inc. | Polishing pad with uniform abrasion |
USRE37997E1 (en) | 1990-01-22 | 2003-02-18 | Micron Technology, Inc. | Polishing pad with controlled abrasion rate |
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