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Individual
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Individual
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Priority to JP9842174ApriorityCriticalpatent/JPS51125157A/en
Publication of JPS51125157ApublicationCriticalpatent/JPS51125157A/en
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications
(AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof
(AREA)
Compositions Of Macromolecular Compounds
(AREA)
Paints Or Removers
(AREA)
Abstract
PURPOSE: A photosensitive resinous composition capable of forming insoluble and infusible crosslinked and cured articles under the irradiation with light in a short time prepared by polymerizing a monomer containing photosensitive groups.
COPYRIGHT: (C)1976,JPO&Japio
JP9842174A1974-08-291974-08-29A photosensitive resinous composition and a process for preparing it
PendingJPS51125157A
(en)