JPS51120615A - Manufacturing method for comb-type electrodes - Google Patents

Manufacturing method for comb-type electrodes

Info

Publication number
JPS51120615A
JPS51120615A JP50045136A JP4513675A JPS51120615A JP S51120615 A JPS51120615 A JP S51120615A JP 50045136 A JP50045136 A JP 50045136A JP 4513675 A JP4513675 A JP 4513675A JP S51120615 A JPS51120615 A JP S51120615A
Authority
JP
Japan
Prior art keywords
comb
type electrodes
manufacturing
expending
obtain high
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50045136A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5613973B2 (enExample
Inventor
Yuji Togami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Broadcasting Corp
Original Assignee
Nippon Hoso Kyokai NHK
Japan Broadcasting Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Hoso Kyokai NHK, Japan Broadcasting Corp filed Critical Nippon Hoso Kyokai NHK
Priority to JP50045136A priority Critical patent/JPS51120615A/ja
Publication of JPS51120615A publication Critical patent/JPS51120615A/ja
Publication of JPS5613973B2 publication Critical patent/JPS5613973B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP50045136A 1975-04-16 1975-04-16 Manufacturing method for comb-type electrodes Granted JPS51120615A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50045136A JPS51120615A (en) 1975-04-16 1975-04-16 Manufacturing method for comb-type electrodes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50045136A JPS51120615A (en) 1975-04-16 1975-04-16 Manufacturing method for comb-type electrodes

Publications (2)

Publication Number Publication Date
JPS51120615A true JPS51120615A (en) 1976-10-22
JPS5613973B2 JPS5613973B2 (enExample) 1981-04-01

Family

ID=12710851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50045136A Granted JPS51120615A (en) 1975-04-16 1975-04-16 Manufacturing method for comb-type electrodes

Country Status (1)

Country Link
JP (1) JPS51120615A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138839A (en) * 1979-04-17 1980-10-30 Nec Kyushu Ltd Method of fabricating semiconductor device
JPS5640831A (en) * 1979-09-10 1981-04-17 Roumiguieres Jean Louis Projecting image of mask having periodically distributed plural slits onto support and its application to lithographic photography
JPS63244736A (ja) * 1987-03-31 1988-10-12 Yokogawa Electric Corp フオト・リソグラフイ装置
JP2015041649A (ja) * 2013-08-20 2015-03-02 株式会社東芝 パターン形成方法、露光用マスク及び露光装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138839A (en) * 1979-04-17 1980-10-30 Nec Kyushu Ltd Method of fabricating semiconductor device
JPS5640831A (en) * 1979-09-10 1981-04-17 Roumiguieres Jean Louis Projecting image of mask having periodically distributed plural slits onto support and its application to lithographic photography
JPS63244736A (ja) * 1987-03-31 1988-10-12 Yokogawa Electric Corp フオト・リソグラフイ装置
JP2015041649A (ja) * 2013-08-20 2015-03-02 株式会社東芝 パターン形成方法、露光用マスク及び露光装置
US9329490B2 (en) 2013-08-20 2016-05-03 Kabushiki Kaisha Toshiba Pattern formation method, mask for exposure, and exposure apparatus

Also Published As

Publication number Publication date
JPS5613973B2 (enExample) 1981-04-01

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