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Hitachi Ltd
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Hitachi Ltd
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Publication date
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP4237375ApriorityCriticalpatent/JPS51117866A/en
Publication of JPS51117866ApublicationCriticalpatent/JPS51117866A/en
PURPOSE: To secure a feeble electron beam irradiation to a broader area than micromicro-electron beam bundle before or sumultaneously with irradiation of microelectron beam.