JPS51108577A - - Google Patents
Info
- Publication number
- JPS51108577A JPS51108577A JP50032230A JP3223075A JPS51108577A JP S51108577 A JPS51108577 A JP S51108577A JP 50032230 A JP50032230 A JP 50032230A JP 3223075 A JP3223075 A JP 3223075A JP S51108577 A JPS51108577 A JP S51108577A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50032230A JPS51108577A (xx) | 1975-03-19 | 1975-03-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50032230A JPS51108577A (xx) | 1975-03-19 | 1975-03-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS51108577A true JPS51108577A (xx) | 1976-09-25 |
Family
ID=12353157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50032230A Pending JPS51108577A (xx) | 1975-03-19 | 1975-03-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51108577A (xx) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5369034A (en) * | 1976-11-29 | 1978-06-20 | Du Pont | Liquid stacking method |
| JPS5710232A (en) * | 1980-06-23 | 1982-01-19 | Nec Corp | Forming method for resist pattern |
| JPS5754317A (en) * | 1980-09-19 | 1982-03-31 | Hitachi Ltd | Method and device for forming pattern |
| JPS6263429A (ja) * | 1985-09-13 | 1987-03-20 | Iwatsu Electric Co Ltd | レジスト露光方法と装置 |
| JPH0527564A (ja) * | 1991-07-23 | 1993-02-05 | Kyocera Corp | 画像形成装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4959574A (xx) * | 1972-10-05 | 1974-06-10 |
-
1975
- 1975-03-19 JP JP50032230A patent/JPS51108577A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4959574A (xx) * | 1972-10-05 | 1974-06-10 |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5369034A (en) * | 1976-11-29 | 1978-06-20 | Du Pont | Liquid stacking method |
| JPS5537738B2 (xx) * | 1976-11-29 | 1980-09-30 | ||
| JPS5710232A (en) * | 1980-06-23 | 1982-01-19 | Nec Corp | Forming method for resist pattern |
| JPS5754317A (en) * | 1980-09-19 | 1982-03-31 | Hitachi Ltd | Method and device for forming pattern |
| JPS6346973B2 (xx) * | 1980-09-19 | 1988-09-20 | Hitachi Ltd | |
| JPS6263429A (ja) * | 1985-09-13 | 1987-03-20 | Iwatsu Electric Co Ltd | レジスト露光方法と装置 |
| JPH0527564A (ja) * | 1991-07-23 | 1993-02-05 | Kyocera Corp | 画像形成装置 |