JPS51100716A - - Google Patents

Info

Publication number
JPS51100716A
JPS51100716A JP51007863A JP786376A JPS51100716A JP S51100716 A JPS51100716 A JP S51100716A JP 51007863 A JP51007863 A JP 51007863A JP 786376 A JP786376 A JP 786376A JP S51100716 A JPS51100716 A JP S51100716A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP51007863A
Other languages
Japanese (ja)
Other versions
JPS5929850B2 (en
Inventor
Nemuseku Jozefu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Publication of JPS51100716A publication Critical patent/JPS51100716A/ja
Publication of JPS5929850B2 publication Critical patent/JPS5929850B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91Polymers modified by chemical after-treatment
    • C08G63/912Polymers modified by chemical after-treatment derived from hydroxycarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025Crosslinking or vulcanising agents; including accelerators
JP51007863A 1975-01-27 1976-01-27 Photopolymerizable composition Expired JPS5929850B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3366/75A GB1539192A (en) 1975-01-27 1975-01-27 Photopolymerisable compositions

Publications (2)

Publication Number Publication Date
JPS51100716A true JPS51100716A (en) 1976-09-06
JPS5929850B2 JPS5929850B2 (en) 1984-07-24

Family

ID=9756970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51007863A Expired JPS5929850B2 (en) 1975-01-27 1976-01-27 Photopolymerizable composition

Country Status (13)

Country Link
JP (1) JPS5929850B2 (en)
AU (1) AU500898B2 (en)
BE (1) BE837782A (en)
DE (1) DE2602574C2 (en)
DK (1) DK32176A (en)
FR (1) FR2298558A1 (en)
GB (1) GB1539192A (en)
IE (1) IE42402B1 (en)
IT (1) IT1068132B (en)
NL (1) NL7600760A (en)
NZ (1) NZ179793A (en)
SE (1) SE431990B (en)
ZA (1) ZA76429B (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5513780A (en) * 1978-05-09 1980-01-30 Dynachem Corp Fluoran coupler containing phototropic photosensitive composition
JPS6076735A (en) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol Photosetting resin composition
JPS6078443A (en) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol Photo-insoluble resin composition
JPS6078442A (en) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol Photosetting resin composition
JPS62102242A (en) * 1985-10-28 1987-05-12 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション Photosetting composition
JPS63261352A (en) * 1987-04-20 1988-10-28 Fuji Photo Film Co Ltd Photosensitive composition
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1516351A (en) 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
GB2027435B (en) * 1977-12-16 1982-11-24 Gen Electric Curable resin compositions
GB2013208B (en) * 1977-12-16 1982-11-24 Gen Electric Heat curable compositions
ATE6002T1 (en) * 1978-10-27 1984-02-15 Imperial Chemical Industries Plc POLYMERIZABLE COMPOSITIONS, COATINGS MADE THEREOF AND OTHER POLYMERIZED PRODUCTS.
DE2854011C2 (en) * 1978-12-14 1983-04-21 General Electric Co., Schenectady, N.Y. Thermosetting composition and process for its manufacture
DE3029247C2 (en) * 1979-08-03 1996-04-11 Gen Electric UV-curable silicone coating compositions, process for their preparation and their use
US4279717A (en) * 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
DE3107087A1 (en) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "PHOTOPOLYMERIZABLE MIXTURES AND METHOD FOR PHOTOPOLYMERISATION OF CATIONICALLY POLYMERIZABLE COMPOUNDS"
US4336366A (en) * 1980-02-29 1982-06-22 Ciba-Geigy Corporation Thermally polymerizable mixtures and processes for the thermally-initiated polymerization of cationically polymerizable compounds
US4351708A (en) * 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
JPS60206328A (en) * 1984-03-30 1985-10-17 Matsushita Electric Ind Co Ltd High frequency circuit device
US4689289A (en) * 1986-04-30 1987-08-25 General Electric Company Block polymer compositions
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
DE3940965A1 (en) * 1989-12-12 1991-06-13 Basf Ag RADIATION-SENSITIVE MIXTURE AND METHOD FOR PRODUCING RELIEF STRUCTURES
EP0502819A1 (en) * 1991-03-01 1992-09-09 Ciba-Geigy Ag Acid hardenable copolymers
US5292614A (en) * 1991-08-02 1994-03-08 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern
US5286600A (en) * 1991-08-27 1994-02-15 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern by means thereof
EP0659781A3 (en) * 1993-12-21 1995-09-27 Ciba Geigy Ag Copolymers of maleimide, for photoresists.
JP3976350B2 (en) 1997-03-14 2007-09-19 スリーエム カンパニー Moisture curable composition that cures on demand with reactive silane functionality
GB9921779D0 (en) 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
US20080241745A1 (en) 2007-03-29 2008-10-02 Fujifilm Corporation Negative resist composition and pattern forming method using the same
CN101855026A (en) 2007-11-14 2010-10-06 富士胶片株式会社 Method of drying coating film and process for producing lithographic printing plate precursor
JP2009236355A (en) 2008-03-26 2009-10-15 Fujifilm Corp Drying method and device
JP5743783B2 (en) 2011-07-27 2015-07-01 富士フイルム株式会社 Photosensitive composition, planographic printing plate precursor, and polyurethane
EP4077413A1 (en) 2019-12-18 2022-10-26 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same
FR3105231B1 (en) * 2019-12-18 2021-12-10 Photon Polymers PHOTORADICAL PROCESS FOR CURING AN ALKYD RESIN

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1516351A (en) 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5513780A (en) * 1978-05-09 1980-01-30 Dynachem Corp Fluoran coupler containing phototropic photosensitive composition
JPS6352369B2 (en) * 1978-05-09 1988-10-18 Dynachem Corp
JPS6076735A (en) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol Photosetting resin composition
JPS6078442A (en) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol Photosetting resin composition
JPH0336421B2 (en) * 1983-10-04 1991-05-31 Kogyo Gijutsuin
JPH0344287B2 (en) * 1983-10-04 1991-07-05 Kogyo Gijutsuin
JPS6078443A (en) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol Photo-insoluble resin composition
JPH0565869B2 (en) * 1983-10-05 1993-09-20 Kogyo Gijutsuin
JPS62102242A (en) * 1985-10-28 1987-05-12 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション Photosetting composition
JPS63261352A (en) * 1987-04-20 1988-10-28 Fuji Photo Film Co Ltd Photosensitive composition
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same

Also Published As

Publication number Publication date
SE431990B (en) 1984-03-12
DE2602574A1 (en) 1976-07-29
GB1539192A (en) 1979-01-31
AU500898B2 (en) 1979-06-07
IE42402B1 (en) 1980-07-30
NL7600760A (en) 1976-07-29
FR2298558A1 (en) 1976-08-20
IT1068132B (en) 1985-03-21
AU1053676A (en) 1977-08-11
ZA76429B (en) 1977-09-28
DK32176A (en) 1976-07-28
IE42402L (en) 1976-07-27
DE2602574C2 (en) 1983-04-21
FR2298558B1 (en) 1980-05-30
BE837782A (en) 1976-07-22
NZ179793A (en) 1978-04-03
SE7600771L (en) 1976-07-28
JPS5929850B2 (en) 1984-07-24

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