JPS51100109A - - Google Patents
Info
- Publication number
- JPS51100109A JPS51100109A JP51005805A JP580576A JPS51100109A JP S51100109 A JPS51100109 A JP S51100109A JP 51005805 A JP51005805 A JP 51005805A JP 580576 A JP580576 A JP 580576A JP S51100109 A JPS51100109 A JP S51100109A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/006—Thin film resistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Non-Adjustable Resistors (AREA)
- Electronic Switches (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Inorganic Insulating Materials (AREA)
- Chemical Vapour Deposition (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/543,629 US4010312A (en) | 1975-01-23 | 1975-01-23 | High resistance cermet film and method of making the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51100109A true JPS51100109A (US20030157376A1-20030821-M00001.png) | 1976-09-03 |
| JPS5615712B2 JPS5615712B2 (US20030157376A1-20030821-M00001.png) | 1981-04-11 |
Family
ID=24168848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP580576A Expired JPS5615712B2 (US20030157376A1-20030821-M00001.png) | 1975-01-23 | 1976-01-20 |
Country Status (7)
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01217715A (ja) * | 1988-02-24 | 1989-08-31 | Sharp Corp | 磁気ヘッドのガラス充填材 |
| JPH03193633A (ja) * | 1989-12-19 | 1991-08-23 | Reiko Co Ltd | ガラス質の膜状スペーサー |
| JPH04279005A (ja) * | 1991-03-07 | 1992-10-05 | Fuji Xerox Co Ltd | 抵抗体 |
| JPH04279002A (ja) * | 1991-03-07 | 1992-10-05 | Fuji Xerox Co Ltd | 抵抗体膜形成材料 |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4312915A (en) * | 1978-01-30 | 1982-01-26 | Massachusetts Institute Of Technology | Cermet film selective black absorber |
| US4167015A (en) * | 1978-04-24 | 1979-09-04 | Rca Corporation | Cermet layer for amorphous silicon solar cells |
| US4162505A (en) * | 1978-04-24 | 1979-07-24 | Rca Corporation | Inverted amorphous silicon solar cell utilizing cermet layers |
| US4166918A (en) * | 1978-07-19 | 1979-09-04 | Rca Corporation | Method of removing the effects of electrical shorts and shunts created during the fabrication process of a solar cell |
| US4370594A (en) * | 1978-11-29 | 1983-01-25 | Rca Corporation | Resistive lens structure for electron gun |
| US4281270A (en) * | 1979-06-25 | 1981-07-28 | Rca Corporation | Precoated resistive lens structure for electron gun and method of fabrication |
| US4243911A (en) * | 1979-08-28 | 1981-01-06 | Rca Corporation | Resistive lens electron gun with compound linear voltage profile |
| US4243912A (en) * | 1979-08-28 | 1981-01-06 | Rca Corporation | Simplified resistive lens electron gun with compound linear voltage profile |
| US4604545A (en) * | 1980-07-28 | 1986-08-05 | Rca Corporation | Photomultiplier tube having a high resistance dynode support spacer anti-hysteresis pattern |
| US4322277A (en) * | 1980-11-17 | 1982-03-30 | Rca Corporation | Step mask for substrate sputtering |
| US4465577A (en) * | 1983-03-31 | 1984-08-14 | Gould, Inc. | Method and device relating to thin-film cermets |
| US4675091A (en) * | 1986-04-16 | 1987-06-23 | United States Of America As Represented By The Secretary Of The Navy | Co-sputtered thermionic cathodes and fabrication thereof |
| US5605609A (en) * | 1988-03-03 | 1997-02-25 | Asahi Glass Company Ltd. | Method for forming low refractive index film comprising silicon dioxide |
| KR960005321B1 (ko) * | 1990-04-24 | 1996-04-23 | 가부시끼가이샤 히다찌세이사꾸쇼 | 박막저항체를 갖는 전자회로소자 및 그 제조방법 |
| WO1993008136A1 (en) * | 1991-10-18 | 1993-04-29 | Battelle Memorial Institute | Process for producing interwoven composite materials |
| US6030681A (en) * | 1997-07-10 | 2000-02-29 | Raychem Corporation | Magnetic disk comprising a substrate with a cermet layer on a porcelain |
| US6258218B1 (en) | 1999-10-22 | 2001-07-10 | Sola International Holdings, Ltd. | Method and apparatus for vacuum coating plastic parts |
| US7355238B2 (en) * | 2004-12-06 | 2008-04-08 | Asahi Glass Company, Limited | Nonvolatile semiconductor memory device having nanoparticles for charge retention |
| US20080083611A1 (en) * | 2006-10-06 | 2008-04-10 | Tegal Corporation | High-adhesive backside metallization |
| US20090246385A1 (en) * | 2008-03-25 | 2009-10-01 | Tegal Corporation | Control of crystal orientation and stress in sputter deposited thin films |
| US8808513B2 (en) * | 2008-03-25 | 2014-08-19 | Oem Group, Inc | Stress adjustment in reactive sputtering |
| US8482375B2 (en) * | 2009-05-24 | 2013-07-09 | Oem Group, Inc. | Sputter deposition of cermet resistor films with low temperature coefficient of resistance |
| DE102013007644B4 (de) * | 2013-05-06 | 2017-09-21 | Hochschule Für Technik Und Wirtschaft Des Saarlandes | Anordnung zur Messung einer Dehnung, eines Druckes oder einer Kraft mit einer Widerstandsschicht |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE88701C (US20030157376A1-20030821-M00001.png) * | ||||
| US3200010A (en) * | 1961-12-11 | 1965-08-10 | Beckman Instruments Inc | Electrical resistance element |
| US3326720A (en) * | 1963-02-12 | 1967-06-20 | Beckman Instruments Inc | Cermet resistance composition and resistor |
| US3329526A (en) * | 1965-06-14 | 1967-07-04 | Cts Corp | Electrical resistance element and method of making the same |
| US3326645A (en) * | 1965-09-22 | 1967-06-20 | Beckman Instruments Inc | Cermet resistance element and material |
| US3416960A (en) * | 1966-05-09 | 1968-12-17 | Beckman Instruments Inc | Cermet resistors, their composition and method of manufacture |
| US3484284A (en) * | 1967-08-15 | 1969-12-16 | Corning Glass Works | Electroconductive composition and method |
| US3879278A (en) * | 1970-07-06 | 1975-04-22 | Airco Inc | Composite cermet thin films |
| US3669724A (en) * | 1970-09-28 | 1972-06-13 | Motorola Inc | Method of vapor depositing a tungsten-tungsten oxide coating |
-
1975
- 1975-01-23 US US05/543,629 patent/US4010312A/en not_active Expired - Lifetime
- 1975-10-31 GB GB45226/75A patent/GB1514527A/en not_active Expired
-
1976
- 1976-01-15 CA CA243,628A patent/CA1057490A/en not_active Expired
- 1976-01-15 FR FR7600930A patent/FR2298863A1/fr active Granted
- 1976-01-17 DE DE2601656A patent/DE2601656C2/de not_active Expired
- 1976-01-20 JP JP580576A patent/JPS5615712B2/ja not_active Expired
- 1976-01-21 IT IT47718/76A patent/IT1060474B/it active
- 1976-11-26 US US05/745,411 patent/US4071426A/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01217715A (ja) * | 1988-02-24 | 1989-08-31 | Sharp Corp | 磁気ヘッドのガラス充填材 |
| JPH03193633A (ja) * | 1989-12-19 | 1991-08-23 | Reiko Co Ltd | ガラス質の膜状スペーサー |
| JPH04279005A (ja) * | 1991-03-07 | 1992-10-05 | Fuji Xerox Co Ltd | 抵抗体 |
| JPH04279002A (ja) * | 1991-03-07 | 1992-10-05 | Fuji Xerox Co Ltd | 抵抗体膜形成材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4010312A (en) | 1977-03-01 |
| US4071426A (en) | 1978-01-31 |
| DE2601656A1 (de) | 1976-07-29 |
| FR2298863A1 (fr) | 1976-08-20 |
| GB1514527A (en) | 1978-06-14 |
| IT1060474B (it) | 1982-08-20 |
| CA1057490A (en) | 1979-07-03 |
| JPS5615712B2 (US20030157376A1-20030821-M00001.png) | 1981-04-11 |
| DE2601656C2 (de) | 1985-01-10 |
| FR2298863B1 (US20030157376A1-20030821-M00001.png) | 1981-10-09 |
