JPS5099685A - - Google Patents
Info
- Publication number
- JPS5099685A JPS5099685A JP113174A JP113174A JPS5099685A JP S5099685 A JPS5099685 A JP S5099685A JP 113174 A JP113174 A JP 113174A JP 113174 A JP113174 A JP 113174A JP S5099685 A JPS5099685 A JP S5099685A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Weting (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP113174A JPS5539902B2 (enrdf_load_stackoverflow) | 1973-12-29 | 1973-12-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP113174A JPS5539902B2 (enrdf_load_stackoverflow) | 1973-12-29 | 1973-12-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5099685A true JPS5099685A (enrdf_load_stackoverflow) | 1975-08-07 |
| JPS5539902B2 JPS5539902B2 (enrdf_load_stackoverflow) | 1980-10-14 |
Family
ID=11492877
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP113174A Expired JPS5539902B2 (enrdf_load_stackoverflow) | 1973-12-29 | 1973-12-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5539902B2 (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5935429A (ja) * | 1982-08-12 | 1984-02-27 | インタ−ナシヨナル ビジネス マシ−ンズ コ−ポレ−シヨン | 半導体ウエハの製造方法 |
| JPS62102543A (ja) * | 1985-10-28 | 1987-05-13 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 同平坦面の金属層および絶縁層の形成方法 |
| JPS647548A (en) * | 1987-01-09 | 1989-01-11 | Philips Nv | Manufacture of semiconductor device |
| US5084419A (en) * | 1988-03-23 | 1992-01-28 | Nec Corporation | Method of manufacturing semiconductor device using chemical-mechanical polishing |
| JP2015189806A (ja) * | 2014-03-27 | 2015-11-02 | 株式会社フジミインコーポレーテッド | 研磨用組成物、その使用方法、及び基板の製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NO147376C (no) * | 1981-01-05 | 1984-07-03 | Norsk Hydro As | Losse- og toemmeutstyr for bulkgods |
-
1973
- 1973-12-29 JP JP113174A patent/JPS5539902B2/ja not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5935429A (ja) * | 1982-08-12 | 1984-02-27 | インタ−ナシヨナル ビジネス マシ−ンズ コ−ポレ−シヨン | 半導体ウエハの製造方法 |
| JPS62102543A (ja) * | 1985-10-28 | 1987-05-13 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 同平坦面の金属層および絶縁層の形成方法 |
| JPH0817831A (ja) * | 1985-10-28 | 1996-01-19 | Internatl Business Mach Corp <Ibm> | 同平坦面の金属層および二酸化シリコン層の形成方法 |
| JPS647548A (en) * | 1987-01-09 | 1989-01-11 | Philips Nv | Manufacture of semiconductor device |
| US5084419A (en) * | 1988-03-23 | 1992-01-28 | Nec Corporation | Method of manufacturing semiconductor device using chemical-mechanical polishing |
| JP2015189806A (ja) * | 2014-03-27 | 2015-11-02 | 株式会社フジミインコーポレーテッド | 研磨用組成物、その使用方法、及び基板の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5539902B2 (enrdf_load_stackoverflow) | 1980-10-14 |