JPS5098277A - - Google Patents
Info
- Publication number
- JPS5098277A JPS5098277A JP14411573A JP14411573A JPS5098277A JP S5098277 A JPS5098277 A JP S5098277A JP 14411573 A JP14411573 A JP 14411573A JP 14411573 A JP14411573 A JP 14411573A JP S5098277 A JPS5098277 A JP S5098277A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14411573A JPS5098277A (en) | 1973-12-26 | 1973-12-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14411573A JPS5098277A (en) | 1973-12-26 | 1973-12-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5098277A true JPS5098277A (en) | 1975-08-05 |
Family
ID=15354523
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14411573A Pending JPS5098277A (en) | 1973-12-26 | 1973-12-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5098277A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5724942A (en) * | 1980-07-23 | 1982-02-09 | Hitachi Ltd | Original plate for step-and-repeat camera |
| JPS57124733A (en) * | 1980-12-29 | 1982-08-03 | Ibm | Mask for forming image of pattern on photoresist layer |
| JPS6083328A (en) * | 1983-10-13 | 1985-05-11 | Fujitsu Ltd | Inspecting method of photo-mask |
| JPS625242A (en) * | 1985-06-29 | 1987-01-12 | Toshiba Corp | Reticle |
-
1973
- 1973-12-26 JP JP14411573A patent/JPS5098277A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5724942A (en) * | 1980-07-23 | 1982-02-09 | Hitachi Ltd | Original plate for step-and-repeat camera |
| JPS57124733A (en) * | 1980-12-29 | 1982-08-03 | Ibm | Mask for forming image of pattern on photoresist layer |
| JPS6083328A (en) * | 1983-10-13 | 1985-05-11 | Fujitsu Ltd | Inspecting method of photo-mask |
| JPH0456972B2 (en) * | 1983-10-13 | 1992-09-10 | Fujitsu Ltd | |
| JPS625242A (en) * | 1985-06-29 | 1987-01-12 | Toshiba Corp | Reticle |