JPS5095002A - - Google Patents

Info

Publication number
JPS5095002A
JPS5095002A JP63074A JP63074A JPS5095002A JP S5095002 A JPS5095002 A JP S5095002A JP 63074 A JP63074 A JP 63074A JP 63074 A JP63074 A JP 63074A JP S5095002 A JPS5095002 A JP S5095002A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63074A
Other languages
Japanese (ja)
Other versions
JPS5334902B2 (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP63074A priority Critical patent/JPS5334902B2/ja
Publication of JPS5095002A publication Critical patent/JPS5095002A/ja
Publication of JPS5334902B2 publication Critical patent/JPS5334902B2/ja
Expired legal-status Critical Current

Links

JP63074A 1973-12-21 1973-12-21 Expired JPS5334902B2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63074A JPS5334902B2 (fr) 1973-12-21 1973-12-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63074A JPS5334902B2 (fr) 1973-12-21 1973-12-21

Publications (2)

Publication Number Publication Date
JPS5095002A true JPS5095002A (fr) 1975-07-29
JPS5334902B2 JPS5334902B2 (fr) 1978-09-22

Family

ID=11479036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63074A Expired JPS5334902B2 (fr) 1973-12-21 1973-12-21

Country Status (1)

Country Link
JP (1) JPS5334902B2 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4554237A (en) * 1981-12-25 1985-11-19 Hitach, Ltd. Photosensitive resin composition and method for forming fine patterns with said composition
US4740451A (en) * 1981-10-26 1988-04-26 Tokyo Ohka Kogyo Co., Ltd. Photosensitive compositions and a method of patterning using the same
JPH02291559A (ja) * 1989-05-01 1990-12-03 Toyo Gosei Kogyo Kk 遠紫外光用ホトレジスト組成物
US5712022A (en) * 1992-09-14 1998-01-27 Yoshino Kogyosho Co., Ltd. Printed thermoplastic resin products and method for printing such products

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4740451A (en) * 1981-10-26 1988-04-26 Tokyo Ohka Kogyo Co., Ltd. Photosensitive compositions and a method of patterning using the same
US4554237A (en) * 1981-12-25 1985-11-19 Hitach, Ltd. Photosensitive resin composition and method for forming fine patterns with said composition
JPH02291559A (ja) * 1989-05-01 1990-12-03 Toyo Gosei Kogyo Kk 遠紫外光用ホトレジスト組成物
US5712022A (en) * 1992-09-14 1998-01-27 Yoshino Kogyosho Co., Ltd. Printed thermoplastic resin products and method for printing such products

Also Published As

Publication number Publication date
JPS5334902B2 (fr) 1978-09-22

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