JPS508658B1 - - Google Patents
Info
- Publication number
- JPS508658B1 JPS508658B1 JP5384770A JP5384770A JPS508658B1 JP S508658 B1 JPS508658 B1 JP S508658B1 JP 5384770 A JP5384770 A JP 5384770A JP 5384770 A JP5384770 A JP 5384770A JP S508658 B1 JPS508658 B1 JP S508658B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5384770A JPS508658B1 (en) | 1970-06-19 | 1970-06-19 | |
DE19712130283 DE2130283A1 (en) | 1970-06-19 | 1971-06-18 | Photosensitive compns - contg alkali-soluble vinyl polymers and ortho-quinonone diazides developable in alkaline |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5384770A JPS508658B1 (en) | 1970-06-19 | 1970-06-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS508658B1 true JPS508658B1 (en) | 1975-04-05 |
Family
ID=12954149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5384770A Pending JPS508658B1 (en) | 1970-06-19 | 1970-06-19 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS508658B1 (en) |
DE (1) | DE2130283A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013504097A (en) * | 2009-09-08 | 2013-02-04 | イーストマン コダック カンパニー | Positive radiation sensitive imageable element |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1375461A (en) * | 1972-05-05 | 1974-11-27 | ||
JPS56147804A (en) * | 1980-04-17 | 1981-11-17 | Agency Of Ind Science & Technol | Photosensitive resin material for forming fluorescent surface of cathode ray tube |
EP0077057B2 (en) * | 1981-10-09 | 1989-08-16 | Dai Nippon Insatsu Kabushiki Kaisha | Negative-type resist sensitive to ionizing radiation |
JPS58134631A (en) * | 1982-01-08 | 1983-08-10 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
US5264319A (en) * | 1985-05-10 | 1993-11-23 | Hitachi, Ltd. | Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor |
DE4235151A1 (en) * | 1992-10-19 | 1994-04-21 | Hoechst Ag | Polyvinyl acetals which can form emulsifier-free aqueous dispersions and redispersible dry powders, processes for their preparation and their use |
US8048609B2 (en) * | 2008-12-19 | 2011-11-01 | Eastman Kodak Company | Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s |
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1970
- 1970-06-19 JP JP5384770A patent/JPS508658B1/ja active Pending
-
1971
- 1971-06-18 DE DE19712130283 patent/DE2130283A1/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013504097A (en) * | 2009-09-08 | 2013-02-04 | イーストマン コダック カンパニー | Positive radiation sensitive imageable element |
Also Published As
Publication number | Publication date |
---|---|
DE2130283A1 (en) | 1971-12-23 |