JPS5083528A - - Google Patents
Info
- Publication number
- JPS5083528A JPS5083528A JP13421573A JP13421573A JPS5083528A JP S5083528 A JPS5083528 A JP S5083528A JP 13421573 A JP13421573 A JP 13421573A JP 13421573 A JP13421573 A JP 13421573A JP S5083528 A JPS5083528 A JP S5083528A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13421573A JPS5638686B2 (en) | 1973-11-28 | 1973-11-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13421573A JPS5638686B2 (en) | 1973-11-28 | 1973-11-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5083528A true JPS5083528A (en) | 1975-07-05 |
| JPS5638686B2 JPS5638686B2 (en) | 1981-09-08 |
Family
ID=15123107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13421573A Expired JPS5638686B2 (en) | 1973-11-28 | 1973-11-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5638686B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160036511A (en) | 2014-09-25 | 2016-04-04 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Sulfonium salt, resist composition and resist pattern forming process |
| KR20160103950A (en) | 2015-02-25 | 2016-09-02 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Chemically Amplified Positive Resist Composition and Pattern Forming Process |
| KR20170017790A (en) | 2015-08-05 | 2017-02-15 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Poymer compound, positive resist composition, laminate, and resist patterning process |
| KR20180016276A (en) | 2016-08-05 | 2018-02-14 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Positive resist composition, resist pattern forming process, and photomask blank |
| KR20180077082A (en) | 2016-12-28 | 2018-07-06 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Chemically amplified positive resist composition and resist pattern forming process |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0211931U (en) * | 1988-07-04 | 1990-01-25 |
-
1973
- 1973-11-28 JP JP13421573A patent/JPS5638686B2/ja not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160036511A (en) | 2014-09-25 | 2016-04-04 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Sulfonium salt, resist composition and resist pattern forming process |
| KR20160103950A (en) | 2015-02-25 | 2016-09-02 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Chemically Amplified Positive Resist Composition and Pattern Forming Process |
| KR20170017790A (en) | 2015-08-05 | 2017-02-15 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Poymer compound, positive resist composition, laminate, and resist patterning process |
| KR20180016276A (en) | 2016-08-05 | 2018-02-14 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Positive resist composition, resist pattern forming process, and photomask blank |
| KR20180077082A (en) | 2016-12-28 | 2018-07-06 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Chemically amplified positive resist composition and resist pattern forming process |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5638686B2 (en) | 1981-09-08 |