JPS507785A - - Google Patents
Info
- Publication number
- JPS507785A JPS507785A JP5780073A JP5780073A JPS507785A JP S507785 A JPS507785 A JP S507785A JP 5780073 A JP5780073 A JP 5780073A JP 5780073 A JP5780073 A JP 5780073A JP S507785 A JPS507785 A JP S507785A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5780073A JPS565573B2 (ja) | 1973-05-25 | 1973-05-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5780073A JPS565573B2 (ja) | 1973-05-25 | 1973-05-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS507785A true JPS507785A (ja) | 1975-01-27 |
| JPS565573B2 JPS565573B2 (ja) | 1981-02-05 |
Family
ID=13065969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5780073A Expired JPS565573B2 (ja) | 1973-05-25 | 1973-05-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS565573B2 (ja) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53130976A (en) * | 1977-04-20 | 1978-11-15 | Hitachi Ltd | Epitaxial growing device |
| JPS5665974A (en) * | 1979-11-02 | 1981-06-04 | Komatsu Ltd | Vapor deposition controlling method |
| JPS60196651A (ja) * | 1984-03-21 | 1985-10-05 | Anelva Corp | 成膜、膜質モニタ−方法 |
| JPH04170390A (ja) * | 1990-10-31 | 1992-06-18 | Nichia Chem Ind Ltd | 半導体結晶膜の成長方法および装置 |
| JPH04247637A (ja) * | 1991-02-04 | 1992-09-03 | Nichia Chem Ind Ltd | 半導体結晶膜の表面状態測定方法 |
| JPH10163182A (ja) * | 1996-11-29 | 1998-06-19 | Dainippon Screen Mfg Co Ltd | 基板熱処理装置およびそれに使用可能な膜厚測定装置 |
-
1973
- 1973-05-25 JP JP5780073A patent/JPS565573B2/ja not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53130976A (en) * | 1977-04-20 | 1978-11-15 | Hitachi Ltd | Epitaxial growing device |
| JPS5665974A (en) * | 1979-11-02 | 1981-06-04 | Komatsu Ltd | Vapor deposition controlling method |
| JPS60196651A (ja) * | 1984-03-21 | 1985-10-05 | Anelva Corp | 成膜、膜質モニタ−方法 |
| JPH04170390A (ja) * | 1990-10-31 | 1992-06-18 | Nichia Chem Ind Ltd | 半導体結晶膜の成長方法および装置 |
| JPH04247637A (ja) * | 1991-02-04 | 1992-09-03 | Nichia Chem Ind Ltd | 半導体結晶膜の表面状態測定方法 |
| JPH10163182A (ja) * | 1996-11-29 | 1998-06-19 | Dainippon Screen Mfg Co Ltd | 基板熱処理装置およびそれに使用可能な膜厚測定装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS565573B2 (ja) | 1981-02-05 |