JPS5066449A - - Google Patents
Info
- Publication number
- JPS5066449A JPS5066449A JP11578973A JP11578973A JPS5066449A JP S5066449 A JPS5066449 A JP S5066449A JP 11578973 A JP11578973 A JP 11578973A JP 11578973 A JP11578973 A JP 11578973A JP S5066449 A JPS5066449 A JP S5066449A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11578973A JPS5636227B2 (ja) | 1973-10-17 | 1973-10-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11578973A JPS5636227B2 (ja) | 1973-10-17 | 1973-10-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5066449A true JPS5066449A (ja) | 1975-06-04 |
| JPS5636227B2 JPS5636227B2 (ja) | 1981-08-22 |
Family
ID=14671095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11578973A Expired JPS5636227B2 (ja) | 1973-10-17 | 1973-10-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5636227B2 (ja) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57112018A (en) * | 1980-12-29 | 1982-07-12 | Fujitsu Ltd | Correction of pattern |
| JP2023023183A (ja) * | 2021-08-04 | 2023-02-16 | 株式会社エスケーエレクトロニクス | パターン修正方法およびフォトマスク |
| JP2023023184A (ja) * | 2021-08-04 | 2023-02-16 | 株式会社エスケーエレクトロニクス | パターン修正方法およびフォトマスク |
| TWI833314B (zh) * | 2021-08-04 | 2024-02-21 | 日商Ｓｋ電子股份有限公司 | 圖案校正方法及光掩模 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02112119U (ja) * | 1989-02-28 | 1990-09-07 |
-
1973
- 1973-10-17 JP JP11578973A patent/JPS5636227B2/ja not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57112018A (en) * | 1980-12-29 | 1982-07-12 | Fujitsu Ltd | Correction of pattern |
| JPS6161694B2 (ja) * | 1980-12-29 | 1986-12-26 | Fujitsu Ltd | |
| JP2023023183A (ja) * | 2021-08-04 | 2023-02-16 | 株式会社エスケーエレクトロニクス | パターン修正方法およびフォトマスク |
| JP2023023184A (ja) * | 2021-08-04 | 2023-02-16 | 株式会社エスケーエレクトロニクス | パターン修正方法およびフォトマスク |
| TWI833314B (zh) * | 2021-08-04 | 2024-02-21 | 日商Ｓｋ電子股份有限公司 | 圖案校正方法及光掩模 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5636227B2 (ja) | 1981-08-22 |