JPS5058199A - - Google Patents
Info
- Publication number
- JPS5058199A JPS5058199A JP10623573A JP10623573A JPS5058199A JP S5058199 A JPS5058199 A JP S5058199A JP 10623573 A JP10623573 A JP 10623573A JP 10623573 A JP10623573 A JP 10623573A JP S5058199 A JPS5058199 A JP S5058199A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48106235A JPS5818370B2 (ja) | 1973-09-19 | 1973-09-19 | ノルボルネンジカルボンサンムスイブツルイ ノ キヨウジユウゴウタイ ノ セイゾウホウ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48106235A JPS5818370B2 (ja) | 1973-09-19 | 1973-09-19 | ノルボルネンジカルボンサンムスイブツルイ ノ キヨウジユウゴウタイ ノ セイゾウホウ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5058199A true JPS5058199A (ja) | 1975-05-20 |
JPS5818370B2 JPS5818370B2 (ja) | 1983-04-12 |
Family
ID=14428446
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP48106235A Expired JPS5818370B2 (ja) | 1973-09-19 | 1973-09-19 | ノルボルネンジカルボンサンムスイブツルイ ノ キヨウジユウゴウタイ ノ セイゾウホウ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5818370B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000080124A (ja) * | 1998-08-27 | 2000-03-21 | Hyundai Electronics Ind Co Ltd | フォトレジスト単量体、フォトレジスト共重合体とその製造方法、フォトレジスト組成物、フォトレジストパタ―ン形成方法、および、半導体素子 |
-
1973
- 1973-09-19 JP JP48106235A patent/JPS5818370B2/ja not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000080124A (ja) * | 1998-08-27 | 2000-03-21 | Hyundai Electronics Ind Co Ltd | フォトレジスト単量体、フォトレジスト共重合体とその製造方法、フォトレジスト組成物、フォトレジストパタ―ン形成方法、および、半導体素子 |
Also Published As
Publication number | Publication date |
---|---|
JPS5818370B2 (ja) | 1983-04-12 |