JPS5057186A - - Google Patents

Info

Publication number
JPS5057186A
JPS5057186A JP49102123A JP10212374A JPS5057186A JP S5057186 A JPS5057186 A JP S5057186A JP 49102123 A JP49102123 A JP 49102123A JP 10212374 A JP10212374 A JP 10212374A JP S5057186 A JPS5057186 A JP S5057186A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49102123A
Other versions
JPS524906B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5057186A publication Critical patent/JPS5057186A/ja
Publication of JPS524906B2 publication Critical patent/JPS524906B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes
    • H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
    • H10P95/00—

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
JP49102123A 1973-09-07 1974-09-06 Expired JPS524906B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US395319A US3866310A (en) 1973-09-07 1973-09-07 Method for making the self-aligned gate contact of a semiconductor device

Publications (2)

Publication Number Publication Date
JPS5057186A true JPS5057186A (ja) 1975-05-19
JPS524906B2 JPS524906B2 (ja) 1977-02-08

Family

ID=23562534

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49102123A Expired JPS524906B2 (ja) 1973-09-07 1974-09-06

Country Status (2)

Country Link
US (1) US3866310A (ja)
JP (1) JPS524906B2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6239075A (ja) * 1985-08-14 1987-02-20 Mitsubishi Electric Corp ガリウム砒素半導体集積回路

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4078963A (en) * 1973-12-10 1978-03-14 U.S. Philips Corporation Method of manufacturing a semiconductor device, having a pattern of conductors on a supporting body
US3981757A (en) * 1975-04-14 1976-09-21 Globe-Union Inc. Method of fabricating keyboard apparatus
GB1545208A (en) * 1975-09-27 1979-05-02 Plessey Co Ltd Electrical solid state devices
JPS52117556A (en) * 1976-03-30 1977-10-03 Toshiba Corp Photo mask and its manufacturing method
US4077111A (en) * 1976-07-14 1978-03-07 Westinghouse Electric Corporation Self-aligned gate field effect transistor and method for making same
FR2431768A1 (fr) * 1978-07-20 1980-02-15 Labo Electronique Physique Perfectionnement au procede de fabrication de dispositifs semi-conducteurs par auto-alignement et dispositifs obtenus
US4266333A (en) * 1979-04-27 1981-05-12 Rca Corporation Method of making a Schottky barrier field effect transistor
US4325181A (en) * 1980-12-17 1982-04-20 The United States Of America As Represented By The Secretary Of The Navy Simplified fabrication method for high-performance FET
FR2496982A1 (fr) 1980-12-24 1982-06-25 Labo Electronique Physique Procede de fabrication de transistors a effet de champ, a grille auto-alignee, et transistors ainsi obtenus
US4514893A (en) * 1983-04-29 1985-05-07 At&T Bell Laboratories Fabrication of FETs
JPS6142140A (ja) * 1984-07-30 1986-02-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 自己整合構造の形成方法
FR2571177B1 (fr) * 1984-10-02 1987-02-27 Thomson Csf Procede de realisation de grilles en siliciure ou en silicium pour circuit integre comportant des elements du type grille - isolant - semi-conducteur
US4710478A (en) * 1985-05-20 1987-12-01 United States Of America As Represented By The Secretary Of The Navy Method for making germanium/gallium arsenide high mobility complementary logic transistors
US7132701B1 (en) * 2001-07-27 2006-11-07 Fairchild Semiconductor Corporation Contact method for thin silicon carbide epitaxial layer and semiconductor devices formed by those methods

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3438121A (en) * 1966-07-21 1969-04-15 Gen Instrument Corp Method of making a phosphorous-protected semiconductor device
FR2027546B1 (ja) * 1968-11-22 1976-03-19 Tokyo Shibaura Electric Co
US3761785A (en) * 1971-04-23 1973-09-25 Bell Telephone Labor Inc Methods for making transistor structures

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6239075A (ja) * 1985-08-14 1987-02-20 Mitsubishi Electric Corp ガリウム砒素半導体集積回路

Also Published As

Publication number Publication date
JPS524906B2 (ja) 1977-02-08
US3866310A (en) 1975-02-18

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