JPS5056872A - - Google Patents

Info

Publication number
JPS5056872A
JPS5056872A JP10306973A JP10306973A JPS5056872A JP S5056872 A JPS5056872 A JP S5056872A JP 10306973 A JP10306973 A JP 10306973A JP 10306973 A JP10306973 A JP 10306973A JP S5056872 A JPS5056872 A JP S5056872A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10306973A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10306973A priority Critical patent/JPS5056872A/ja
Publication of JPS5056872A publication Critical patent/JPS5056872A/ja
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP10306973A 1973-09-14 1973-09-14 Pending JPS5056872A (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10306973A JPS5056872A (enrdf_load_stackoverflow) 1973-09-14 1973-09-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10306973A JPS5056872A (enrdf_load_stackoverflow) 1973-09-14 1973-09-14

Publications (1)

Publication Number Publication Date
JPS5056872A true JPS5056872A (enrdf_load_stackoverflow) 1975-05-17

Family

ID=14344356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10306973A Pending JPS5056872A (enrdf_load_stackoverflow) 1973-09-14 1973-09-14

Country Status (1)

Country Link
JP (1) JPS5056872A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55156326A (en) * 1979-05-24 1980-12-05 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacturing method for semiconductor
JPS61259205A (ja) * 1985-05-14 1986-11-17 Nippon Telegr & Teleph Corp <Ntt> 光導波回路用ガラス薄膜の製造方法および製造装置
JPS627007A (ja) * 1985-07-03 1987-01-14 Nippon Telegr & Teleph Corp <Ntt> 光導波回路用ガラス膜の製造方法および製造装置
WO2020105449A1 (ja) * 2018-11-20 2020-05-28 株式会社Ｓｃｒｅｅｎホールディングス 熱処理方法および熱処理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS491172A (enrdf_load_stackoverflow) * 1972-04-17 1974-01-08

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS491172A (enrdf_load_stackoverflow) * 1972-04-17 1974-01-08

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55156326A (en) * 1979-05-24 1980-12-05 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacturing method for semiconductor
JPS61259205A (ja) * 1985-05-14 1986-11-17 Nippon Telegr & Teleph Corp <Ntt> 光導波回路用ガラス薄膜の製造方法および製造装置
JPS627007A (ja) * 1985-07-03 1987-01-14 Nippon Telegr & Teleph Corp <Ntt> 光導波回路用ガラス膜の製造方法および製造装置
WO2020105449A1 (ja) * 2018-11-20 2020-05-28 株式会社Ｓｃｒｅｅｎホールディングス 熱処理方法および熱処理装置

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