JPS504315B1 - - Google Patents

Info

Publication number
JPS504315B1
JPS504315B1 JP836270A JP836270A JPS504315B1 JP S504315 B1 JPS504315 B1 JP S504315B1 JP 836270 A JP836270 A JP 836270A JP 836270 A JP836270 A JP 836270A JP S504315 B1 JPS504315 B1 JP S504315B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP836270A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS504315B1 publication Critical patent/JPS504315B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
JP836270A 1969-01-31 1970-01-30 Pending JPS504315B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691904789 DE1904789A1 (de) 1969-01-31 1969-01-31 Maske zur Abbildung von Mustern auf lichtempfindlichen Schichten

Publications (1)

Publication Number Publication Date
JPS504315B1 true JPS504315B1 (ja) 1975-02-18

Family

ID=5723949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP836270A Pending JPS504315B1 (ja) 1969-01-31 1970-01-30

Country Status (5)

Country Link
US (1) US3758326A (ja)
JP (1) JPS504315B1 (ja)
DE (1) DE1904789A1 (ja)
FR (1) FR2029801A1 (ja)
GB (1) GB1292585A (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE792434A (fr) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc Matiere formatrice d'images et procede de production d'une image
BE792433A (fr) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc Matiere pour la formation d'images et procede de production d'une imag
US3873203A (en) * 1973-03-19 1975-03-25 Motorola Inc Durable high resolution silicon template
US3914515A (en) * 1973-07-16 1975-10-21 Rca Corp Process for forming transition metal oxide films on a substrate and photomasks therefrom
US3906133A (en) * 1974-04-23 1975-09-16 Harris Corp Nitrocellulose protective coating on masks used in IC manufacture
US4022927A (en) * 1975-06-30 1977-05-10 International Business Machines Corporation Methods for forming thick self-supporting masks
JPS52117556A (en) * 1976-03-30 1977-10-03 Toshiba Corp Photo mask and its manufacturing method
US4178403A (en) * 1977-08-04 1979-12-11 Konishiroku Photo Industry Co., Ltd. Mask blank and mask
US4218503A (en) * 1977-12-02 1980-08-19 Rockwell International Corporation X-ray lithographic mask using rare earth and transition element compounds and method of fabrication thereof
US4537813A (en) * 1982-09-27 1985-08-27 At&T Technologies, Inc. Photomask encapsulation
US4656107A (en) * 1983-06-24 1987-04-07 Rca Corporation Photographic printing plate for use in a vacuum printing frame
US4664996A (en) * 1983-06-24 1987-05-12 Rca Corporation Method for etching a flat apertured mask for use in a cathode-ray tube
US4588676A (en) * 1983-06-24 1986-05-13 Rca Corporation Photoexposing a photoresist-coated sheet in a vacuum printing frame
US4964146A (en) * 1985-07-31 1990-10-16 Hitachi, Ltd. Pattern transistor mask and method of using the same
US4765743A (en) * 1987-03-10 1988-08-23 Rca Licensing Corporation Method of inspecting a master member

Also Published As

Publication number Publication date
FR2029801A1 (ja) 1970-10-23
DE1904789A1 (de) 1970-09-10
GB1292585A (en) 1972-10-11
US3758326A (en) 1973-09-11

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