JPS5039055A - - Google Patents
Info
- Publication number
- JPS5039055A JPS5039055A JP8843873A JP8843873A JPS5039055A JP S5039055 A JPS5039055 A JP S5039055A JP 8843873 A JP8843873 A JP 8843873A JP 8843873 A JP8843873 A JP 8843873A JP S5039055 A JPS5039055 A JP S5039055A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48088438A JPS5751727B2 (ja) | 1973-08-08 | 1973-08-08 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48088438A JPS5751727B2 (ja) | 1973-08-08 | 1973-08-08 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2430581A Division JPS56139126A (en) | 1981-02-23 | 1981-02-23 | Apparatus for vacuum treatment |
JP2430481A Division JPS56138919A (en) | 1981-02-23 | 1981-02-23 | Device for impurity deposition against semiconductor wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5039055A true JPS5039055A (ja) | 1975-04-10 |
JPS5751727B2 JPS5751727B2 (ja) | 1982-11-04 |
Family
ID=13942789
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP48088438A Expired JPS5751727B2 (ja) | 1973-08-08 | 1973-08-08 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5751727B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5361272A (en) * | 1976-11-15 | 1978-06-01 | Hitachi Ltd | Boron impurity high concentration diffusion method to semiconductor |
JPS60255991A (ja) * | 1984-05-21 | 1985-12-17 | オーエムアイ・インターナシヨナル・コーポレーシヨン | 酸性亜鉛電解質用の改良キヤリヤー光沢剤 |
-
1973
- 1973-08-08 JP JP48088438A patent/JPS5751727B2/ja not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5361272A (en) * | 1976-11-15 | 1978-06-01 | Hitachi Ltd | Boron impurity high concentration diffusion method to semiconductor |
JPS60255991A (ja) * | 1984-05-21 | 1985-12-17 | オーエムアイ・インターナシヨナル・コーポレーシヨン | 酸性亜鉛電解質用の改良キヤリヤー光沢剤 |
JPH0346553B2 (ja) * | 1984-05-21 | 1991-07-16 | Omi Int Corp |
Also Published As
Publication number | Publication date |
---|---|
JPS5751727B2 (ja) | 1982-11-04 |