JPS5034445B2 - - Google Patents

Info

Publication number
JPS5034445B2
JPS5034445B2 JP47020133A JP2013372A JPS5034445B2 JP S5034445 B2 JPS5034445 B2 JP S5034445B2 JP 47020133 A JP47020133 A JP 47020133A JP 2013372 A JP2013372 A JP 2013372A JP S5034445 B2 JPS5034445 B2 JP S5034445B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP47020133A
Other languages
Japanese (ja)
Other versions
JPS4889004A (US06229276-20010508-P00081.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47020133A priority Critical patent/JPS5034445B2/ja
Priority to US00280484A priority patent/US3832188A/en
Priority to GB3946972A priority patent/GB1377535A/en
Priority to FR7230413A priority patent/FR2173881B1/fr
Priority to CA157,288A priority patent/CA974396A/en
Publication of JPS4889004A publication Critical patent/JPS4889004A/ja
Publication of JPS5034445B2 publication Critical patent/JPS5034445B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387Polyamides or polyimides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C08G69/36Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from amino acids, polyamines and polycarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • C08K5/50Phosphorus bound to carbon only
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/107Polyamide or polyurethane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/118Initiator containing with inhibitor or stabilizer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Proteomics, Peptides & Aminoacids (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polyamides (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP47020133A 1972-02-29 1972-02-29 Expired JPS5034445B2 (US06229276-20010508-P00081.png)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP47020133A JPS5034445B2 (US06229276-20010508-P00081.png) 1972-02-29 1972-02-29
US00280484A US3832188A (en) 1972-02-29 1972-08-14 Photosensitive polyamide compositions
GB3946972A GB1377535A (en) 1972-02-29 1972-08-24 Photosensitive compositions
FR7230413A FR2173881B1 (US06229276-20010508-P00081.png) 1972-02-29 1972-08-25
CA157,288A CA974396A (en) 1972-02-29 1972-11-23 Photosensitive polyamide composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47020133A JPS5034445B2 (US06229276-20010508-P00081.png) 1972-02-29 1972-02-29

Publications (2)

Publication Number Publication Date
JPS4889004A JPS4889004A (US06229276-20010508-P00081.png) 1973-11-21
JPS5034445B2 true JPS5034445B2 (US06229276-20010508-P00081.png) 1975-11-08

Family

ID=12018623

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47020133A Expired JPS5034445B2 (US06229276-20010508-P00081.png) 1972-02-29 1972-02-29

Country Status (5)

Country Link
US (1) US3832188A (US06229276-20010508-P00081.png)
JP (1) JPS5034445B2 (US06229276-20010508-P00081.png)
CA (1) CA974396A (US06229276-20010508-P00081.png)
FR (1) FR2173881B1 (US06229276-20010508-P00081.png)
GB (1) GB1377535A (US06229276-20010508-P00081.png)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62134319A (ja) * 1985-12-09 1987-06-17 Nippon Radiator Co Ltd 自動車用空気清浄器
JPH0111241Y2 (US06229276-20010508-P00081.png) * 1982-08-26 1989-03-31
JPH0235816U (US06229276-20010508-P00081.png) * 1988-09-02 1990-03-08
JPH0586620U (ja) * 1991-07-10 1993-11-22 スタンレー電気株式会社 車両用空気清浄器のフィルタ構造

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1408265A (en) * 1971-10-18 1975-10-01 Ici Ltd Photopolymerisable composition
GB1495746A (en) * 1974-07-05 1977-12-21 Ciba Geigy Ag Polymerisation of unsaturated amides
US4145222A (en) * 1974-11-19 1979-03-20 Toyobo Co., Ltd. Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt
US4188223A (en) * 1977-12-30 1980-02-12 Monsanto Company Amino-functional photopolymer compositions and photo-oxidation imaging processes employing same
DE2909992A1 (de) * 1979-03-14 1980-10-02 Basf Ag Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen
US4233391A (en) * 1978-09-11 1980-11-11 Napp Systems (Usa) Inc. Water developable photopolymerizable compositions containing phosphine activators and saponified polyvinyl acetate
US4234674A (en) * 1979-08-08 1980-11-18 Monsanto Company Amino-functional photopolymer compositions and photo-oxidation imaging processes employing same
US6743273B2 (en) * 2000-09-05 2004-06-01 Donaldson Company, Inc. Polymer, polymer microfiber, polymer nanofiber and applications including filter structures
US20100175555A1 (en) * 2008-09-12 2010-07-15 Ismael Ferrer Polyamide Fine Fibers
CN110835307B (zh) * 2018-08-16 2023-04-07 江苏百赛飞生物科技有限公司 可聚合光敏单体、基于其的光敏聚合物及生物材料表面改性方法
CN112210050B (zh) * 2019-07-09 2022-06-03 江苏百赛飞生物科技有限公司 一种紫外光固化嵌段共聚物及其制备方法和用途

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0111241Y2 (US06229276-20010508-P00081.png) * 1982-08-26 1989-03-31
JPS62134319A (ja) * 1985-12-09 1987-06-17 Nippon Radiator Co Ltd 自動車用空気清浄器
JPH0235816U (US06229276-20010508-P00081.png) * 1988-09-02 1990-03-08
JPH0586620U (ja) * 1991-07-10 1993-11-22 スタンレー電気株式会社 車両用空気清浄器のフィルタ構造

Also Published As

Publication number Publication date
FR2173881B1 (US06229276-20010508-P00081.png) 1976-08-13
GB1377535A (en) 1974-12-18
JPS4889004A (US06229276-20010508-P00081.png) 1973-11-21
FR2173881A1 (US06229276-20010508-P00081.png) 1973-10-12
US3832188A (en) 1974-08-27
CA974396A (en) 1975-09-16

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