JPS5029511A - - Google Patents

Info

Publication number
JPS5029511A
JPS5029511A JP7755473A JP7755473A JPS5029511A JP S5029511 A JPS5029511 A JP S5029511A JP 7755473 A JP7755473 A JP 7755473A JP 7755473 A JP7755473 A JP 7755473A JP S5029511 A JPS5029511 A JP S5029511A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7755473A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7755473A priority Critical patent/JPS5029511A/ja
Publication of JPS5029511A publication Critical patent/JPS5029511A/ja
Pending legal-status Critical Current

Links

JP7755473A 1973-07-11 1973-07-11 Pending JPS5029511A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7755473A JPS5029511A (en) 1973-07-11 1973-07-11

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7755473A JPS5029511A (en) 1973-07-11 1973-07-11

Publications (1)

Publication Number Publication Date
JPS5029511A true JPS5029511A (en) 1975-03-25

Family

ID=13637222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7755473A Pending JPS5029511A (en) 1973-07-11 1973-07-11

Country Status (1)

Country Link
JP (1) JPS5029511A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0265518U (en) * 1988-11-09 1990-05-17
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
WO2013047911A1 (en) * 2011-09-30 2013-04-04 Fujifilm Corporation Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic device
JP2017125190A (en) * 2016-01-11 2017-07-20 財團法人工業技術研究院Industrial Technology Research Institute Polymerization method of polyarylene sulfide
US10184028B2 (en) 2016-01-11 2019-01-22 Industrial Technology Research Institute Method for preparing a polymer
US10287396B2 (en) 2016-01-11 2019-05-14 Industrial Technology Research Institute Polymer
US10377705B2 (en) 2016-01-11 2019-08-13 Industrial Technology Research Institute Method for preparing polyarylene sulfide (PAS) monomer

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
JPH0265518U (en) * 1988-11-09 1990-05-17
WO2013047911A1 (en) * 2011-09-30 2013-04-04 Fujifilm Corporation Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic device
JP2013083971A (en) * 2011-09-30 2013-05-09 Fujifilm Corp Active ray-sensitive or radiation-sensitive resin composition, active ray-sensitive or radiation-sensitive film and pattern formation method using the same, and electronic device manufacturing method and electronic device
JP2017125190A (en) * 2016-01-11 2017-07-20 財團法人工業技術研究院Industrial Technology Research Institute Polymerization method of polyarylene sulfide
US10184028B2 (en) 2016-01-11 2019-01-22 Industrial Technology Research Institute Method for preparing a polymer
US10287396B2 (en) 2016-01-11 2019-05-14 Industrial Technology Research Institute Polymer
US10377705B2 (en) 2016-01-11 2019-08-13 Industrial Technology Research Institute Method for preparing polyarylene sulfide (PAS) monomer

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