JPS502867A - - Google Patents
Info
- Publication number
- JPS502867A JPS502867A JP5183573A JP5183573A JPS502867A JP S502867 A JPS502867 A JP S502867A JP 5183573 A JP5183573 A JP 5183573A JP 5183573 A JP5183573 A JP 5183573A JP S502867 A JPS502867 A JP S502867A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5183573A JPS502867A (en) | 1973-05-09 | 1973-05-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5183573A JPS502867A (en) | 1973-05-09 | 1973-05-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS502867A true JPS502867A (en) | 1975-01-13 |
Family
ID=12897905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5183573A Pending JPS502867A (en) | 1973-05-09 | 1973-05-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS502867A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51147180A (en) * | 1975-06-12 | 1976-12-17 | Fujitsu Ltd | Method of manufacturing of semiconductor device |
| JPS5285030A (en) * | 1976-01-09 | 1977-07-15 | Nippon Kokan Kk | High resistant electroozinc plated steel plate and production method thereof |
| JPS5643156U (en) * | 1979-09-12 | 1981-04-20 | ||
| JPS5647590A (en) * | 1979-09-25 | 1981-04-30 | Whyco Chromium Co | Lower portion cladding and corrosion resistance improvement method thereby |
| US4439283A (en) * | 1982-01-29 | 1984-03-27 | Omi International Corporation | Zinc cobalt alloy plating |
| JPS5994825A (en) * | 1982-11-24 | 1984-05-31 | Nec Corp | Alignment method for semiconductor wafer |
| JPS62247372A (en) * | 1987-02-06 | 1987-10-28 | Hitachi Ltd | Method for reduced projection exposure |
| JPH0338820A (en) * | 1989-07-05 | 1991-02-19 | Seiko Instr Inc | Manufacture of semiconductor device |
-
1973
- 1973-05-09 JP JP5183573A patent/JPS502867A/ja active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51147180A (en) * | 1975-06-12 | 1976-12-17 | Fujitsu Ltd | Method of manufacturing of semiconductor device |
| JPS5285030A (en) * | 1976-01-09 | 1977-07-15 | Nippon Kokan Kk | High resistant electroozinc plated steel plate and production method thereof |
| JPS5644959B2 (en) * | 1976-01-09 | 1981-10-22 | ||
| JPS5643156U (en) * | 1979-09-12 | 1981-04-20 | ||
| JPS5647590A (en) * | 1979-09-25 | 1981-04-30 | Whyco Chromium Co | Lower portion cladding and corrosion resistance improvement method thereby |
| US4439283A (en) * | 1982-01-29 | 1984-03-27 | Omi International Corporation | Zinc cobalt alloy plating |
| JPS5994825A (en) * | 1982-11-24 | 1984-05-31 | Nec Corp | Alignment method for semiconductor wafer |
| JPS62247372A (en) * | 1987-02-06 | 1987-10-28 | Hitachi Ltd | Method for reduced projection exposure |
| JPS6341050B2 (en) * | 1987-02-06 | 1988-08-15 | Hitachi Ltd | |
| JPH0338820A (en) * | 1989-07-05 | 1991-02-19 | Seiko Instr Inc | Manufacture of semiconductor device |