JPS5020934A - - Google Patents

Info

Publication number
JPS5020934A
JPS5020934A JP5888174A JP5888174A JPS5020934A JP S5020934 A JPS5020934 A JP S5020934A JP 5888174 A JP5888174 A JP 5888174A JP 5888174 A JP5888174 A JP 5888174A JP S5020934 A JPS5020934 A JP S5020934A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5888174A
Other languages
Japanese (ja)
Other versions
JPS5843469B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5020934A publication Critical patent/JPS5020934A/ja
Publication of JPS5843469B2 publication Critical patent/JPS5843469B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02Combined electrolytic and electrophoretic processes with charged materials
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
JP49058881A 1973-06-01 1974-05-27 Method for forming a nickel electrodeposition layer or a nickel-cobalt electrodeposition layer with a matte luster on a metal surface Expired JPS5843469B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732327881 DE2327881B2 (en) 1973-06-01 1973-06-01 Process for the galvanic deposition of matt-glossy nickel or nickel / cobalt deposits

Publications (2)

Publication Number Publication Date
JPS5020934A true JPS5020934A (en) 1975-03-05
JPS5843469B2 JPS5843469B2 (en) 1983-09-27

Family

ID=5882747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49058881A Expired JPS5843469B2 (en) 1973-06-01 1974-05-27 Method for forming a nickel electrodeposition layer or a nickel-cobalt electrodeposition layer with a matte luster on a metal surface

Country Status (6)

Country Link
JP (1) JPS5843469B2 (en)
BR (1) BR7404495D0 (en)
CA (1) CA1027893A (en)
DE (1) DE2327881B2 (en)
FR (1) FR2231772B1 (en)
GB (1) GB1408748A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142704A (en) * 1985-12-18 1987-06-26 Sumitomo Electric Ind Ltd Composite sintered material
JPH0339495A (en) * 1989-07-04 1991-02-20 C Uyemura & Co Ltd Satin nickel or nickel alloy plating bath and plating method
JP4811880B2 (en) * 2006-01-06 2011-11-09 エントン インコーポレイテッド Electrolyte and process for depositing a matte metal layer
JP2013129902A (en) * 2011-12-22 2013-07-04 Om Sangyo Kk Plated product and method for producing the same

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3909811A1 (en) * 1989-03-24 1990-09-27 Lpw Chemie Gmbh Use of at least one organic sulphinic acid and/or at least one alkali metal salt of an organic sulphinic acid as an agent ...
DE19540011C2 (en) * 1995-10-27 1998-09-10 Lpw Chemie Gmbh Process for the galvanic deposition of glare-free nickel or nickel alloy deposits
DE10025552C1 (en) * 2000-05-19 2001-08-02 Atotech Deutschland Gmbh Acidic electroplating nickel bath and process for depositing a satin nickel or nickel alloy coating
JP4128005B2 (en) * 2001-12-28 2008-07-30 日本リーロナール有限会社 Electro nickel plating solution
JP2003193284A (en) 2001-12-28 2003-07-09 Learonal Japan Inc Nickel electroplating solution
DE10222962A1 (en) 2002-05-23 2003-12-11 Atotech Deutschland Gmbh Acidic galvanic bath electrolyte and process for the electrolytic deposition of satin-shining nickel deposits
MY176034A (en) * 2010-05-26 2020-07-22 Mimos Berhad Method of electrodepositing nickel-cobalt alloy, non-aqueous electroplating bath and cell thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3255096A (en) * 1963-11-01 1966-06-07 Harshaw Chem Corp Electrodeposition of nickel
CH486564A (en) * 1967-03-21 1970-02-28 Hoeltgen Rolf Bath for the galvanic deposition of nickel

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142704A (en) * 1985-12-18 1987-06-26 Sumitomo Electric Ind Ltd Composite sintered material
JPH0210843B2 (en) * 1985-12-18 1990-03-09 Sumitomo Electric Industries
JPH0339495A (en) * 1989-07-04 1991-02-20 C Uyemura & Co Ltd Satin nickel or nickel alloy plating bath and plating method
JP4811880B2 (en) * 2006-01-06 2011-11-09 エントン インコーポレイテッド Electrolyte and process for depositing a matte metal layer
JP2013129902A (en) * 2011-12-22 2013-07-04 Om Sangyo Kk Plated product and method for producing the same

Also Published As

Publication number Publication date
FR2231772B1 (en) 1979-02-16
GB1408748A (en) 1975-10-01
DE2327881A1 (en) 1975-01-02
BR7404495D0 (en) 1975-09-23
JPS5843469B2 (en) 1983-09-27
CA1027893A (en) 1978-03-14
DE2327881B2 (en) 1978-06-22
FR2231772A1 (en) 1974-12-27
DE2327881C3 (en) 1979-02-08

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