JPS5019681A - - Google Patents
Info
- Publication number
- JPS5019681A JPS5019681A JP7086373A JP7086373A JPS5019681A JP S5019681 A JPS5019681 A JP S5019681A JP 7086373 A JP7086373 A JP 7086373A JP 7086373 A JP7086373 A JP 7086373A JP S5019681 A JPS5019681 A JP S5019681A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7086373A JPS5019681A (fr) | 1973-06-25 | 1973-06-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7086373A JPS5019681A (fr) | 1973-06-25 | 1973-06-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5019681A true JPS5019681A (fr) | 1975-03-01 |
Family
ID=13443810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7086373A Pending JPS5019681A (fr) | 1973-06-25 | 1973-06-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5019681A (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61235578A (ja) * | 1986-01-06 | 1986-10-20 | Semiconductor Energy Lab Co Ltd | 反応炉内を清浄にする方法 |
| WO2019155978A1 (fr) * | 2018-02-06 | 2019-08-15 | キヤノンアネルバ株式会社 | Dispositif de traitement de substrat et procédé de traitement de substrat |
-
1973
- 1973-06-25 JP JP7086373A patent/JPS5019681A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61235578A (ja) * | 1986-01-06 | 1986-10-20 | Semiconductor Energy Lab Co Ltd | 反応炉内を清浄にする方法 |
| JPH021235B2 (fr) * | 1986-01-06 | 1990-01-10 | Handotai Energy Kenkyusho | |
| WO2019155978A1 (fr) * | 2018-02-06 | 2019-08-15 | キヤノンアネルバ株式会社 | Dispositif de traitement de substrat et procédé de traitement de substrat |
| US11270873B2 (en) | 2018-02-06 | 2022-03-08 | Canon Anelva Corporation | Substrate processing apparatus and substrate processing method |
| US11694882B2 (en) | 2018-02-06 | 2023-07-04 | Canon Anelva Corporation | Substrate processing apparatus and substrate processing method |