JPS5018176A - - Google Patents
Info
- Publication number
- JPS5018176A JPS5018176A JP6939173A JP6939173A JPS5018176A JP S5018176 A JPS5018176 A JP S5018176A JP 6939173 A JP6939173 A JP 6939173A JP 6939173 A JP6939173 A JP 6939173A JP S5018176 A JPS5018176 A JP S5018176A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6939173A JPS5018176A (ja) | 1973-06-20 | 1973-06-20 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6939173A JPS5018176A (ja) | 1973-06-20 | 1973-06-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5018176A true JPS5018176A (ja) | 1975-02-26 |
Family
ID=13401240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6939173A Pending JPS5018176A (ja) | 1973-06-20 | 1973-06-20 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5018176A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5723219A (en) * | 1980-07-16 | 1982-02-06 | Nec Corp | Manufacture of semiconductor device |
US6022780A (en) * | 1996-12-06 | 2000-02-08 | Nec Corporation | Semiconductor device having source and drain regions different in depth from each other and process of fabrication thereof |
US6617594B1 (en) | 1998-10-30 | 2003-09-09 | Applied Materials, Inc. | Method and device for ion implanting |
-
1973
- 1973-06-20 JP JP6939173A patent/JPS5018176A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5723219A (en) * | 1980-07-16 | 1982-02-06 | Nec Corp | Manufacture of semiconductor device |
US6022780A (en) * | 1996-12-06 | 2000-02-08 | Nec Corporation | Semiconductor device having source and drain regions different in depth from each other and process of fabrication thereof |
US6617594B1 (en) | 1998-10-30 | 2003-09-09 | Applied Materials, Inc. | Method and device for ion implanting |