JPS5017887B2 - - Google Patents
Info
- Publication number
- JPS5017887B2 JPS5017887B2 JP46083032A JP8303271A JPS5017887B2 JP S5017887 B2 JPS5017887 B2 JP S5017887B2 JP 46083032 A JP46083032 A JP 46083032A JP 8303271 A JP8303271 A JP 8303271A JP S5017887 B2 JPS5017887 B2 JP S5017887B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Color Printing (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (member.php) | 1971-10-20 | 1971-10-20 | |
| GB4896071A GB1375395A (member.php) | 1970-10-24 | 1971-10-21 | |
| DE19712153043 DE2153043A1 (de) | 1970-10-24 | 1971-10-25 | Aufzeichnungsmaterial |
| US420884A US3912831A (en) | 1970-10-24 | 1973-12-03 | Recording material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (member.php) | 1971-10-20 | 1971-10-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4849508A JPS4849508A (member.php) | 1973-07-12 |
| JPS5017887B2 true JPS5017887B2 (member.php) | 1975-06-25 |
Family
ID=13790874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46083032A Expired JPS5017887B2 (member.php) | 1970-10-24 | 1971-10-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5017887B2 (member.php) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5192206A (member.php) * | 1975-02-07 | 1976-08-12 | ||
| EP3062151B1 (en) * | 2011-08-12 | 2021-05-05 | Mitsubishi Gas Chemical Company, Inc. | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom |
| CN104995559B (zh) | 2013-02-08 | 2020-04-07 | 三菱瓦斯化学株式会社 | 抗蚀剂组合物、抗蚀图案形成方法和用于其的多元酚衍生物 |
| WO2016104214A1 (ja) | 2014-12-25 | 2016-06-30 | 三菱瓦斯化学株式会社 | 化合物、樹脂、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜、パターン形成方法及び精製方法 |
| US11480877B2 (en) | 2015-03-31 | 2022-10-25 | Mitsubishi Gas Chemical Company, Inc. | Resist composition, method for forming resist pattern, and polyphenol compound used therein |
| CN107533291B (zh) | 2015-03-31 | 2021-06-11 | 三菱瓦斯化学株式会社 | 化合物、抗蚀剂组合物及使用其的抗蚀图案形成方法 |
| EP3346335A4 (en) | 2015-08-31 | 2019-06-26 | Mitsubishi Gas Chemical Company, Inc. | MATERIAL FOR FORMING LITHOGRAPHY OF LAYER LAYERS, COMPOSITION FOR FORMING LITHOGRAPHY LAYER LAYERS, LITHOGRAPHY LAYERINGS AND METHOD FOR THE PRODUCTION THEREOF, PATTERN FORMULATION, RESIN AND CLEANING METHOD |
| US11137686B2 (en) | 2015-08-31 | 2021-10-05 | Mitsubishi Gas Chemical Company, Inc. | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method |
| US11243467B2 (en) | 2015-09-10 | 2022-02-08 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method |
-
1971
- 1971-10-20 JP JP46083032A patent/JPS5017887B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4849508A (member.php) | 1973-07-12 |