JPS50158280A - - Google Patents

Info

Publication number
JPS50158280A
JPS50158280A JP6505474A JP6505474A JPS50158280A JP S50158280 A JPS50158280 A JP S50158280A JP 6505474 A JP6505474 A JP 6505474A JP 6505474 A JP6505474 A JP 6505474A JP S50158280 A JPS50158280 A JP S50158280A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6505474A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6505474A priority Critical patent/JPS50158280A/ja
Publication of JPS50158280A publication Critical patent/JPS50158280A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6505474A 1974-06-10 1974-06-10 Pending JPS50158280A (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6505474A JPS50158280A (enrdf_load_stackoverflow) 1974-06-10 1974-06-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6505474A JPS50158280A (enrdf_load_stackoverflow) 1974-06-10 1974-06-10

Publications (1)

Publication Number Publication Date
JPS50158280A true JPS50158280A (enrdf_load_stackoverflow) 1975-12-22

Family

ID=13275845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6505474A Pending JPS50158280A (enrdf_load_stackoverflow) 1974-06-10 1974-06-10

Country Status (1)

Country Link
JP (1) JPS50158280A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4530895A (en) * 1982-08-13 1985-07-23 Hoechst Aktiengesellschaft Aqueous-alkaline solution and process for developing positive-working reproduction layers
JPS61151537A (ja) * 1984-12-25 1986-07-10 Toshiba Corp ポジ型フオトレジスト現像液組成物
JPS61185745A (ja) * 1985-02-14 1986-08-19 Toshiba Corp ポジ型フオトレジスト現像液組成物

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM TECHNICAL DISCLOSURE BULLETIN#V13#N7=1970 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4530895A (en) * 1982-08-13 1985-07-23 Hoechst Aktiengesellschaft Aqueous-alkaline solution and process for developing positive-working reproduction layers
JPS61151537A (ja) * 1984-12-25 1986-07-10 Toshiba Corp ポジ型フオトレジスト現像液組成物
JPS61185745A (ja) * 1985-02-14 1986-08-19 Toshiba Corp ポジ型フオトレジスト現像液組成物

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