JPS50158280A - - Google Patents
Info
- Publication number
- JPS50158280A JPS50158280A JP6505474A JP6505474A JPS50158280A JP S50158280 A JPS50158280 A JP S50158280A JP 6505474 A JP6505474 A JP 6505474A JP 6505474 A JP6505474 A JP 6505474A JP S50158280 A JPS50158280 A JP S50158280A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6505474A JPS50158280A (cs) | 1974-06-10 | 1974-06-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6505474A JPS50158280A (cs) | 1974-06-10 | 1974-06-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50158280A true JPS50158280A (cs) | 1975-12-22 |
Family
ID=13275845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6505474A Pending JPS50158280A (cs) | 1974-06-10 | 1974-06-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS50158280A (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4530895A (en) * | 1982-08-13 | 1985-07-23 | Hoechst Aktiengesellschaft | Aqueous-alkaline solution and process for developing positive-working reproduction layers |
| JPS61151537A (ja) * | 1984-12-25 | 1986-07-10 | Toshiba Corp | ポジ型フオトレジスト現像液組成物 |
| JPS61185745A (ja) * | 1985-02-14 | 1986-08-19 | Toshiba Corp | ポジ型フオトレジスト現像液組成物 |
-
1974
- 1974-06-10 JP JP6505474A patent/JPS50158280A/ja active Pending
Non-Patent Citations (1)
| Title |
|---|
| IBM TECHNICAL DISCLOSURE BULLETIN#V13#N7=1970 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4530895A (en) * | 1982-08-13 | 1985-07-23 | Hoechst Aktiengesellschaft | Aqueous-alkaline solution and process for developing positive-working reproduction layers |
| JPS61151537A (ja) * | 1984-12-25 | 1986-07-10 | Toshiba Corp | ポジ型フオトレジスト現像液組成物 |
| JPS61185745A (ja) * | 1985-02-14 | 1986-08-19 | Toshiba Corp | ポジ型フオトレジスト現像液組成物 |