JPS50147877A - - Google Patents
Info
- Publication number
- JPS50147877A JPS50147877A JP5108574A JP5108574A JPS50147877A JP S50147877 A JPS50147877 A JP S50147877A JP 5108574 A JP5108574 A JP 5108574A JP 5108574 A JP5108574 A JP 5108574A JP S50147877 A JPS50147877 A JP S50147877A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5108574A JPS5733700B2 (https=) | 1974-05-08 | 1974-05-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5108574A JPS5733700B2 (https=) | 1974-05-08 | 1974-05-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50147877A true JPS50147877A (https=) | 1975-11-27 |
| JPS5733700B2 JPS5733700B2 (https=) | 1982-07-19 |
Family
ID=12876966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5108574A Expired JPS5733700B2 (https=) | 1974-05-08 | 1974-05-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5733700B2 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5633819A (en) * | 1979-08-29 | 1981-04-04 | Fujitsu Ltd | Preparation of semiconductor device |
| JPS58106873A (ja) * | 1981-12-18 | 1983-06-25 | Seiko Epson Corp | 半導体装置の製造方法 |
| JP2002329721A (ja) * | 2001-04-26 | 2002-11-15 | Tokyo Electron Ltd | 半導体装置の製造方法 |
-
1974
- 1974-05-08 JP JP5108574A patent/JPS5733700B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5633819A (en) * | 1979-08-29 | 1981-04-04 | Fujitsu Ltd | Preparation of semiconductor device |
| JPS58106873A (ja) * | 1981-12-18 | 1983-06-25 | Seiko Epson Corp | 半導体装置の製造方法 |
| JP2002329721A (ja) * | 2001-04-26 | 2002-11-15 | Tokyo Electron Ltd | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5733700B2 (https=) | 1982-07-19 |