JPS5014274A - - Google Patents

Info

Publication number
JPS5014274A
JPS5014274A JP49042680A JP4268074A JPS5014274A JP S5014274 A JPS5014274 A JP S5014274A JP 49042680 A JP49042680 A JP 49042680A JP 4268074 A JP4268074 A JP 4268074A JP S5014274 A JPS5014274 A JP S5014274A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49042680A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5014274A publication Critical patent/JPS5014274A/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/02Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the solid state
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/223Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S118/00Coating apparatus
    • Y10S118/90Semiconductor vapor doping

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Centrifugal Separators (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Wire Bonding (AREA)
  • Manufacture And Refinement Of Metals (AREA)
JP49042680A 1973-04-17 1974-04-16 Pending JPS5014274A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2319481A DE2319481C3 (de) 1973-04-17 1973-04-17 Verfahren zum Einbau einer Fremdsubstanz in ein Halbleiter-Grundmaterial, insbesondere zur Dotierung oder Legierung von Halbleiterkörpern und Ultrazentrifuge zur Durchführung des Verfahrens

Publications (1)

Publication Number Publication Date
JPS5014274A true JPS5014274A (ja) 1975-02-14

Family

ID=5878425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49042680A Pending JPS5014274A (ja) 1973-04-17 1974-04-16

Country Status (8)

Country Link
US (1) US3957547A (ja)
JP (1) JPS5014274A (ja)
CA (1) CA1053130A (ja)
DE (1) DE2319481C3 (ja)
FR (1) FR2226210B1 (ja)
GB (1) GB1465102A (ja)
IT (1) IT1006469B (ja)
NL (1) NL7405223A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7512177A (nl) * 1975-09-23 1977-03-25 Balzers Patent Beteilig Ag Vacuuminstallatie voor het behandelen van een produkt in het bijzonder een vacuumopdampin- stallatie.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2996418A (en) * 1957-06-05 1961-08-15 Gen Motors Corp Method and apparatus for vapor depositing thin films
US3301213A (en) * 1962-10-23 1967-01-31 Ibm Epitaxial reactor apparatus
US3806360A (en) * 1966-12-15 1974-04-23 Western Electric Co Methods for heating and/or coating articles
US3594227A (en) * 1968-07-12 1971-07-20 Bell Telephone Labor Inc Method for treating semiconductor slices with gases
US3713883A (en) * 1970-05-27 1973-01-30 Western Electric Co Method of and apparatus for growing crystals from a solution

Also Published As

Publication number Publication date
DE2319481B2 (de) 1978-01-12
NL7405223A (ja) 1974-10-21
DE2319481A1 (de) 1974-11-07
IT1006469B (it) 1976-09-30
CA1053130A (en) 1979-04-24
FR2226210B1 (ja) 1977-10-14
GB1465102A (en) 1977-02-23
DE2319481C3 (de) 1978-09-07
US3957547A (en) 1976-05-18
FR2226210A1 (ja) 1974-11-15

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