JPS50139082A - - Google Patents
Info
- Publication number
- JPS50139082A JPS50139082A JP4721474A JP4721474A JPS50139082A JP S50139082 A JPS50139082 A JP S50139082A JP 4721474 A JP4721474 A JP 4721474A JP 4721474 A JP4721474 A JP 4721474A JP S50139082 A JPS50139082 A JP S50139082A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4721474A JPS559058B2 (cg-RX-API-DMAC7.html) | 1974-04-26 | 1974-04-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4721474A JPS559058B2 (cg-RX-API-DMAC7.html) | 1974-04-26 | 1974-04-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50139082A true JPS50139082A (cg-RX-API-DMAC7.html) | 1975-11-06 |
| JPS559058B2 JPS559058B2 (cg-RX-API-DMAC7.html) | 1980-03-07 |
Family
ID=12768894
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4721474A Expired JPS559058B2 (cg-RX-API-DMAC7.html) | 1974-04-26 | 1974-04-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS559058B2 (cg-RX-API-DMAC7.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59197145A (ja) * | 1979-12-21 | 1984-11-08 | バリアン・アソシエイツ・インコ−ポレイテツド | ウエ−ハ処理装置 |
| US4842683A (en) * | 1986-12-19 | 1989-06-27 | Applied Materials, Inc. | Magnetic field-enhanced plasma etch reactor |
| US4909314A (en) * | 1979-12-21 | 1990-03-20 | Varian Associates, Inc. | Apparatus for thermal treatment of a wafer in an evacuated environment |
-
1974
- 1974-04-26 JP JP4721474A patent/JPS559058B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59197145A (ja) * | 1979-12-21 | 1984-11-08 | バリアン・アソシエイツ・インコ−ポレイテツド | ウエ−ハ処理装置 |
| US4909314A (en) * | 1979-12-21 | 1990-03-20 | Varian Associates, Inc. | Apparatus for thermal treatment of a wafer in an evacuated environment |
| US4842683A (en) * | 1986-12-19 | 1989-06-27 | Applied Materials, Inc. | Magnetic field-enhanced plasma etch reactor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS559058B2 (cg-RX-API-DMAC7.html) | 1980-03-07 |