JPS559058B2 - - Google Patents
Info
- Publication number
- JPS559058B2 JPS559058B2 JP4721474A JP4721474A JPS559058B2 JP S559058 B2 JPS559058 B2 JP S559058B2 JP 4721474 A JP4721474 A JP 4721474A JP 4721474 A JP4721474 A JP 4721474A JP S559058 B2 JPS559058 B2 JP S559058B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4721474A JPS559058B2 (ja) | 1974-04-26 | 1974-04-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4721474A JPS559058B2 (ja) | 1974-04-26 | 1974-04-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50139082A JPS50139082A (ja) | 1975-11-06 |
| JPS559058B2 true JPS559058B2 (ja) | 1980-03-07 |
Family
ID=12768894
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4721474A Expired JPS559058B2 (ja) | 1974-04-26 | 1974-04-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS559058B2 (ja) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4756815A (en) * | 1979-12-21 | 1988-07-12 | Varian Associates, Inc. | Wafer coating system |
| US4909314A (en) * | 1979-12-21 | 1990-03-20 | Varian Associates, Inc. | Apparatus for thermal treatment of a wafer in an evacuated environment |
| US4842683A (en) * | 1986-12-19 | 1989-06-27 | Applied Materials, Inc. | Magnetic field-enhanced plasma etch reactor |
-
1974
- 1974-04-26 JP JP4721474A patent/JPS559058B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50139082A (ja) | 1975-11-06 |