JPS50134769A - - Google Patents

Info

Publication number
JPS50134769A
JPS50134769A JP4094974A JP4094974A JPS50134769A JP S50134769 A JPS50134769 A JP S50134769A JP 4094974 A JP4094974 A JP 4094974A JP 4094974 A JP4094974 A JP 4094974A JP S50134769 A JPS50134769 A JP S50134769A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4094974A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4094974A priority Critical patent/JPS50134769A/ja
Publication of JPS50134769A publication Critical patent/JPS50134769A/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP4094974A 1974-04-15 1974-04-15 Pending JPS50134769A (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4094974A JPS50134769A (enrdf_load_stackoverflow) 1974-04-15 1974-04-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4094974A JPS50134769A (enrdf_load_stackoverflow) 1974-04-15 1974-04-15

Publications (1)

Publication Number Publication Date
JPS50134769A true JPS50134769A (enrdf_load_stackoverflow) 1975-10-25

Family

ID=12594743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4094974A Pending JPS50134769A (enrdf_load_stackoverflow) 1974-04-15 1974-04-15

Country Status (1)

Country Link
JP (1) JPS50134769A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5248707U (enrdf_load_stackoverflow) * 1975-10-03 1977-04-07
JPS5370870U (enrdf_load_stackoverflow) * 1976-11-15 1978-06-14
JPS57201020A (en) * 1981-06-05 1982-12-09 Hitachi Ltd Reactive sputter etching method
WO1988007757A1 (en) * 1987-03-31 1988-10-06 Kabushiki Kaisha Toshiba Method of determining end point of cleaning in an apparatus for manufacturing semiconductor devices
JPH02111020A (ja) * 1988-10-20 1990-04-24 Toshiba Corp プラズマ処理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3664942A (en) * 1970-12-31 1972-05-23 Ibm End point detection method and apparatus for sputter etching

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3664942A (en) * 1970-12-31 1972-05-23 Ibm End point detection method and apparatus for sputter etching

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5248707U (enrdf_load_stackoverflow) * 1975-10-03 1977-04-07
JPS5370870U (enrdf_load_stackoverflow) * 1976-11-15 1978-06-14
JPS57201020A (en) * 1981-06-05 1982-12-09 Hitachi Ltd Reactive sputter etching method
WO1988007757A1 (en) * 1987-03-31 1988-10-06 Kabushiki Kaisha Toshiba Method of determining end point of cleaning in an apparatus for manufacturing semiconductor devices
JPH02111020A (ja) * 1988-10-20 1990-04-24 Toshiba Corp プラズマ処理装置

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