JPS50126443A - - Google Patents

Info

Publication number
JPS50126443A
JPS50126443A JP50015526A JP1552675A JPS50126443A JP S50126443 A JPS50126443 A JP S50126443A JP 50015526 A JP50015526 A JP 50015526A JP 1552675 A JP1552675 A JP 1552675A JP S50126443 A JPS50126443 A JP S50126443A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50015526A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50126443A publication Critical patent/JPS50126443A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP50015526A 1974-03-21 1975-02-07 Pending JPS50126443A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US453235A US3865483A (en) 1974-03-21 1974-03-21 Alignment illumination system

Publications (1)

Publication Number Publication Date
JPS50126443A true JPS50126443A (ja) 1975-10-04

Family

ID=23799723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50015526A Pending JPS50126443A (ja) 1974-03-21 1975-02-07

Country Status (5)

Country Link
US (1) US3865483A (ja)
JP (1) JPS50126443A (ja)
DE (1) DE2506628A1 (ja)
FR (1) FR2265112B1 (ja)
GB (1) GB1457394A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS6432625A (en) * 1988-05-06 1989-02-02 Hitachi Ltd Exposure method for semiconductor
JPH071161B2 (ja) * 1985-05-11 1995-01-11 ライカ インドゥストリーフェルヴァルツング ゲゼルシャフト ミット ベシュレンクテル ハフツング 二次元的な対象物を整向、検査及び／または測定するための方法及び装置

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3917399A (en) * 1974-10-02 1975-11-04 Tropel Catadioptric projection printer
US3989384A (en) * 1975-05-30 1976-11-02 The United States Of America As Represented By The Secretary Of The Army System for measuring small angular motions
JPS5212577A (en) * 1975-07-21 1977-01-31 Nippon Kogaku Kk <Nikon> Automatic location device
JPS5952535B2 (ja) * 1977-01-21 1984-12-20 キヤノン株式会社 光学装置
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren
DE2900921C2 (de) * 1979-01-11 1981-06-04 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren zum Projektionskopieren von Masken auf ein Werkstück
FR2450470A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique de projection en photorepetition
US4353087A (en) * 1979-03-12 1982-10-05 The Perkin-Elmer Corporation Automatic mask alignment
US4383757A (en) * 1979-04-02 1983-05-17 Optimetrix Corporation Optical focusing system
US4540278A (en) * 1979-04-02 1985-09-10 Optimetrix Corporation Optical focusing system
JPS55149929A (en) * 1979-05-10 1980-11-21 Dainippon Screen Mfg Co Ltd Positioning method of projected image in projection enlarger
JPS5624504A (en) * 1979-08-06 1981-03-09 Canon Inc Photoelectric detector
EP0035580B1 (de) * 1980-03-10 1985-10-02 Eaton-Optimetrix Inc. Interferometrisch gesteuerter Werktisch und Positionsregelschaltung
DE3044554A1 (de) 1980-11-26 1982-06-24 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Verfahren und anordnung zur pruefung der uebereinstimmung von visier- und ziellinien
US4492465A (en) * 1980-12-18 1985-01-08 The Boeing Company Retro-reflective electro-optical angle measuring system
US4443103A (en) * 1980-12-18 1984-04-17 The Boeing Company Retro-reflective electro-optical angle measuring system
FR2504281A1 (fr) * 1981-04-16 1982-10-22 Euromask Appareil de projection a dispositif de mise au point
JPS5999721A (ja) * 1982-11-29 1984-06-08 Canon Inc マーク検出装置
GB2137746A (en) * 1983-04-05 1984-10-10 Hewlett Packard Co Apparatus for Detecting Deviations of Position from a Reference
US4703434A (en) * 1984-04-24 1987-10-27 The Perkin-Elmer Corporation Apparatus for measuring overlay error
US4592648A (en) * 1985-01-23 1986-06-03 Perkin-Elmer Censor Anstalt Device for projection copying of masks onto a workpiece
DE3512615A1 (de) * 1985-04-06 1986-10-16 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Anordnung zur ausrichtung, pruefung und/oder vermessung zweidimensionaler objekte
DE3518043A1 (de) * 1985-05-20 1986-11-20 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Vorrichtung zur automatischen bestimmung der abweichung zwischen den strukturen einer vorlage und denen eines vergleichsobjektes
JPS62208630A (ja) * 1986-03-10 1987-09-12 Canon Inc 露光装置
US4721386A (en) * 1986-07-18 1988-01-26 Barnes Engineering Company Three-axis angular monitoring system
US4913328A (en) * 1987-06-05 1990-04-03 Odetics, Inc. Active tape tracking system with crown guide rollers for magnetic recorder/players
GB2231953B (en) * 1989-05-18 1993-01-20 Dynapert Ltd Method of setting up apparatus for handling electrical or electronic components
US5052800A (en) * 1990-05-04 1991-10-01 Cubic Corporation Boresighting method and apparatus
US5204535A (en) * 1991-05-31 1993-04-20 Nikon Corporation Alignment device having irradiation and detection light correcting optical elements
US5929997A (en) * 1997-07-02 1999-07-27 Winbond Electronics Corp. Alignment-mark measurements on the backside of a wafer for synchronous wafer alignment
GB2388896A (en) * 2002-05-21 2003-11-26 Sharp Kk An apparatus for and method of aligning a structure
US11409123B1 (en) * 2022-02-28 2022-08-09 Mloptic Corp. Active self-monitoring binocular calibration target

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1548707C3 (de) * 1966-07-26 1979-02-15 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Fotoelektrischer Schrittgeber
US3476476A (en) * 1967-03-28 1969-11-04 Optomechanisms Inc Alignment means for photo repeat machine
NL6801683A (ja) * 1968-02-06 1969-08-08
FR1593883A (ja) * 1968-02-17 1970-06-01
DE1915891B2 (de) * 1969-03-28 1971-03-18 Vorrichtung zur bestimmung der lagekoordinaten eines punktes mittels eines laserstrahles
DE1919991C3 (de) * 1969-04-19 1973-11-29 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten
US3612698A (en) * 1969-05-01 1971-10-12 Ibm Automatic holographic wafer positioning system and method
DE2003492A1 (de) * 1970-01-27 1971-08-12 Leitz Ernst Gmbh Messverfahren fuer Schrittgeber zum Messen von Laengen oder Winkeln sowie Anordnungen zur Durchfuehrung dieses Messverfahrens
FR2082213A5 (ja) * 1970-03-06 1971-12-10 Delmas Jean Raymond
US3645626A (en) * 1970-06-15 1972-02-29 Ibm Apparatus for detecting defects by optical scanning
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS6352768B2 (ja) * 1981-02-27 1988-10-20 Nippon Kogaku Kk
JPH071161B2 (ja) * 1985-05-11 1995-01-11 ライカ インドゥストリーフェルヴァルツング ゲゼルシャフト ミット ベシュレンクテル ハフツング 二次元的な対象物を整向、検査及び／または測定するための方法及び装置
JPS6432625A (en) * 1988-05-06 1989-02-02 Hitachi Ltd Exposure method for semiconductor
JPH0421331B2 (ja) * 1988-05-06 1992-04-09 Hitachi Ltd

Also Published As

Publication number Publication date
GB1457394A (en) 1976-12-01
US3865483A (en) 1975-02-11
FR2265112A1 (ja) 1975-10-17
FR2265112B1 (ja) 1977-04-15
DE2506628A1 (de) 1975-09-25

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