JPS50122873A - - Google Patents
Info
- Publication number
- JPS50122873A JPS50122873A JP2951174A JP2951174A JPS50122873A JP S50122873 A JPS50122873 A JP S50122873A JP 2951174 A JP2951174 A JP 2951174A JP 2951174 A JP2951174 A JP 2951174A JP S50122873 A JPS50122873 A JP S50122873A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49029511A JPS5755207B2 (fr) | 1974-03-14 | 1974-03-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49029511A JPS5755207B2 (fr) | 1974-03-14 | 1974-03-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50122873A true JPS50122873A (fr) | 1975-09-26 |
| JPS5755207B2 JPS5755207B2 (fr) | 1982-11-22 |
Family
ID=12278110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49029511A Expired JPS5755207B2 (fr) | 1974-03-14 | 1974-03-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5755207B2 (fr) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50126167A (fr) * | 1974-03-23 | 1975-10-03 | ||
| JPS58207669A (ja) * | 1982-05-28 | 1983-12-03 | Toshiba Corp | 半導体装置の製造方法 |
| JPS6246517A (ja) * | 1985-08-23 | 1987-02-28 | Rohm Co Ltd | イオン打込みにおけるマスク構造 |
| JPH02283016A (ja) * | 1989-04-25 | 1990-11-20 | Sony Corp | ホウ素含有半導体層の形成方法 |
| JP2007273588A (ja) * | 2006-03-30 | 2007-10-18 | Fujitsu Ltd | 半導体装置の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4826179A (fr) * | 1971-08-09 | 1973-04-05 |
-
1974
- 1974-03-14 JP JP49029511A patent/JPS5755207B2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4826179A (fr) * | 1971-08-09 | 1973-04-05 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50126167A (fr) * | 1974-03-23 | 1975-10-03 | ||
| JPS58207669A (ja) * | 1982-05-28 | 1983-12-03 | Toshiba Corp | 半導体装置の製造方法 |
| JPS5947466B2 (ja) * | 1982-05-28 | 1984-11-19 | 株式会社東芝 | 半導体装置の製造方法 |
| JPS6246517A (ja) * | 1985-08-23 | 1987-02-28 | Rohm Co Ltd | イオン打込みにおけるマスク構造 |
| JPH02283016A (ja) * | 1989-04-25 | 1990-11-20 | Sony Corp | ホウ素含有半導体層の形成方法 |
| JP2007273588A (ja) * | 2006-03-30 | 2007-10-18 | Fujitsu Ltd | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5755207B2 (fr) | 1982-11-22 |