JPS50122301A - - Google Patents

Info

Publication number
JPS50122301A
JPS50122301A JP49025492A JP2549274A JPS50122301A JP S50122301 A JPS50122301 A JP S50122301A JP 49025492 A JP49025492 A JP 49025492A JP 2549274 A JP2549274 A JP 2549274A JP S50122301 A JPS50122301 A JP S50122301A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49025492A
Other languages
Japanese (ja)
Other versions
JPS5911096B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP49025492A priority Critical patent/JPS5911096B2/en
Priority to DE19752509842 priority patent/DE2509842A1/en
Publication of JPS50122301A publication Critical patent/JPS50122301A/ja
Publication of JPS5911096B2 publication Critical patent/JPS5911096B2/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06Polymerisation of acrylate or methacrylate esters on to polymers thereof
JP49025492A 1974-03-06 1974-03-06 Photosensitive composition for resin letterpress Expired JPS5911096B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP49025492A JPS5911096B2 (en) 1974-03-06 1974-03-06 Photosensitive composition for resin letterpress
DE19752509842 DE2509842A1 (en) 1974-03-06 1975-03-06 Light-sensitive compsn. for relief printing plates - contg. (meth)-acrylic copolymer with hydroxyl gps. and (meth)-acrylic urethane cpd.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49025492A JPS5911096B2 (en) 1974-03-06 1974-03-06 Photosensitive composition for resin letterpress

Publications (2)

Publication Number Publication Date
JPS50122301A true JPS50122301A (en) 1975-09-25
JPS5911096B2 JPS5911096B2 (en) 1984-03-13

Family

ID=12167543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49025492A Expired JPS5911096B2 (en) 1974-03-06 1974-03-06 Photosensitive composition for resin letterpress

Country Status (2)

Country Link
JP (1) JPS5911096B2 (en)
DE (1) DE2509842A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5647411A (en) * 1979-09-28 1981-04-30 Nippon Oil & Fats Co Ltd Polymer of polyoxyalkylene glycol monoacrylate or monomethacrylate and lubricant, antistatic and cosmetic agent therefrom
JPS6042469A (en) * 1983-08-16 1985-03-06 Mitsubishi Rayon Co Ltd Photo-curable type temporary protective coating composition
JP2021059662A (en) * 2019-10-07 2021-04-15 株式会社日本触媒 Resin composition, curable composition, article with coating film, method for producing article with coating film, coating agent and method for producing base material with laminate coating films

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2822190A1 (en) * 1978-05-20 1979-11-22 Hoechst Ag PHOTOPOLYMERIZABLE MIXTURE
DE3329443A1 (en) * 1983-08-16 1985-03-07 Hoechst Ag, 6230 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND COPY MATERIAL MADE THEREOF
DE3504254A1 (en) * 1985-02-08 1986-08-14 Basf Ag, 6700 Ludwigshafen LIGHT SENSITIVE RECORDING ELEMENT
EP0211406A3 (en) * 1985-08-02 1988-08-17 Hoechst Celanese Corporation Photopolymerizable composition with polyvinyl acetal as a binder, and registration material prepared thereof
DE3619130A1 (en) * 1986-06-06 1987-12-10 Basf Ag LIGHT SENSITIVE RECORDING ELEMENT
DE4022980C1 (en) * 1990-07-19 1991-08-08 Du Pont De Nemours (Deutschland) Gmbh, 6380 Bad Homburg, De
EP0628180B1 (en) * 1992-02-24 1998-09-16 E.I. Du Pont De Nemours And Company Pliable, aqueous processable, photoimageable permanent coatings for printed circuits

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4713083Y1 (en) * 1967-04-17 1972-05-13
JPS4826487Y1 (en) * 1968-12-31 1973-08-02

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4832001A (en) * 1971-08-27 1973-04-27
JPS4833904A (en) * 1971-09-01 1973-05-15

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4713083Y1 (en) * 1967-04-17 1972-05-13
JPS4826487Y1 (en) * 1968-12-31 1973-08-02

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5647411A (en) * 1979-09-28 1981-04-30 Nippon Oil & Fats Co Ltd Polymer of polyoxyalkylene glycol monoacrylate or monomethacrylate and lubricant, antistatic and cosmetic agent therefrom
JPS6042469A (en) * 1983-08-16 1985-03-06 Mitsubishi Rayon Co Ltd Photo-curable type temporary protective coating composition
JPH0441190B2 (en) * 1983-08-16 1992-07-07 Mitsubishi Rayon Co
JP2021059662A (en) * 2019-10-07 2021-04-15 株式会社日本触媒 Resin composition, curable composition, article with coating film, method for producing article with coating film, coating agent and method for producing base material with laminate coating films

Also Published As

Publication number Publication date
DE2509842A1 (en) 1975-09-11
JPS5911096B2 (en) 1984-03-13

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