JPS50121197A - - Google Patents

Info

Publication number
JPS50121197A
JPS50121197A JP49018587A JP1858774A JPS50121197A JP S50121197 A JPS50121197 A JP S50121197A JP 49018587 A JP49018587 A JP 49018587A JP 1858774 A JP1858774 A JP 1858774A JP S50121197 A JPS50121197 A JP S50121197A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49018587A
Other languages
Japanese (ja)
Other versions
JPS5722885B2 (cg-RX-API-DMAC10.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1858774A priority Critical patent/JPS5722885B2/ja
Priority to US05/550,366 priority patent/US4003772A/en
Publication of JPS50121197A publication Critical patent/JPS50121197A/ja
Publication of JPS5722885B2 publication Critical patent/JPS5722885B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H10W20/065
    • H10P14/6324

Landscapes

  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • ing And Chemical Polishing (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Weting (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP1858774A 1974-02-18 1974-02-18 Expired JPS5722885B2 (cg-RX-API-DMAC10.html)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1858774A JPS5722885B2 (cg-RX-API-DMAC10.html) 1974-02-18 1974-02-18
US05/550,366 US4003772A (en) 1974-02-18 1975-02-18 Method for preparing thin film integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1858774A JPS5722885B2 (cg-RX-API-DMAC10.html) 1974-02-18 1974-02-18

Publications (2)

Publication Number Publication Date
JPS50121197A true JPS50121197A (cg-RX-API-DMAC10.html) 1975-09-22
JPS5722885B2 JPS5722885B2 (cg-RX-API-DMAC10.html) 1982-05-15

Family

ID=11975748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1858774A Expired JPS5722885B2 (cg-RX-API-DMAC10.html) 1974-02-18 1974-02-18

Country Status (2)

Country Link
US (1) US4003772A (cg-RX-API-DMAC10.html)
JP (1) JPS5722885B2 (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52914A (en) * 1975-06-24 1977-01-06 Tokyo Shibaura Electric Co Chemical etching for surfaces of ceramic articles

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4146440A (en) * 1978-04-03 1979-03-27 Burroughs Corporation Method for forming an aluminum interconnect structure on an integrated circuit chip
US4524378A (en) * 1980-08-04 1985-06-18 Hughes Aircraft Company Anodizable metallic contacts to mercury cadmium telleride
JPS57138191U (cg-RX-API-DMAC10.html) * 1981-02-20 1982-08-28
US4589961A (en) * 1984-08-31 1986-05-20 Sperry Corporation Aluminum mask anodization with lift-off for patterning Josephson junction devices
US4816895A (en) * 1986-03-06 1989-03-28 Nec Corporation Integrated circuit device with an improved interconnection line
US5485019A (en) 1992-02-05 1996-01-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for forming the same
JPH07310191A (ja) * 1994-05-11 1995-11-28 Semiconductor Energy Lab Co Ltd エッチング材料およびエッチング方法
US6093631A (en) 1998-01-15 2000-07-25 International Business Machines Corporation Dummy patterns for aluminum chemical polishing (CMP)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1910736C3 (de) * 1969-03-03 1978-05-11 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von gegeneinander elektrisch isolierten, aus Aluminium bestehenden Leiterbahnen und Anwendung des Verfahrens
US3825453A (en) * 1969-09-25 1974-07-23 Motorola Inc Method of preventing a chemical reaction between aluminum and silicon dioxide in a semiconductor device
US3723258A (en) * 1970-12-14 1973-03-27 Fairchild Camera Instr Co Use of anodized aluminum as electrical insulation and scratch protection for semiconductor devices
US3756924A (en) * 1971-04-01 1973-09-04 Texas Instruments Inc Method of fabricating a semiconductor device
JPS4995592A (cg-RX-API-DMAC10.html) * 1973-01-12 1974-09-10
US3833434A (en) * 1973-02-20 1974-09-03 Hitachi Ltd Method of forming multi-layer interconnections

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52914A (en) * 1975-06-24 1977-01-06 Tokyo Shibaura Electric Co Chemical etching for surfaces of ceramic articles

Also Published As

Publication number Publication date
US4003772A (en) 1977-01-18
JPS5722885B2 (cg-RX-API-DMAC10.html) 1982-05-15

Similar Documents

Publication Publication Date Title
BR7501650A (cg-RX-API-DMAC10.html)
FI751222A7 (cg-RX-API-DMAC10.html)
JPS5722885B2 (cg-RX-API-DMAC10.html)
FI752331A7 (cg-RX-API-DMAC10.html)
FR2257050B1 (cg-RX-API-DMAC10.html)
AU7891375A (cg-RX-API-DMAC10.html)
AU495028B2 (cg-RX-API-DMAC10.html)
DK108675A (cg-RX-API-DMAC10.html)
AU7478474A (cg-RX-API-DMAC10.html)
AU7470174A (cg-RX-API-DMAC10.html)
AU7237274A (cg-RX-API-DMAC10.html)
CS169557B1 (cg-RX-API-DMAC10.html)
CS170699B1 (cg-RX-API-DMAC10.html)
BG19965A1 (cg-RX-API-DMAC10.html)
BG19813A1 (cg-RX-API-DMAC10.html)
CH575985A5 (cg-RX-API-DMAC10.html)
CH596852A5 (cg-RX-API-DMAC10.html)
BG20180A1 (cg-RX-API-DMAC10.html)
BG20140A1 (cg-RX-API-DMAC10.html)
BG20062A1 (cg-RX-API-DMAC10.html)
BG20048A1 (cg-RX-API-DMAC10.html)
BG20017A1 (cg-RX-API-DMAC10.html)
BG19966A1 (cg-RX-API-DMAC10.html)
CH598481A5 (cg-RX-API-DMAC10.html)
BG19962A1 (cg-RX-API-DMAC10.html)