JPS50118977A - - Google Patents
Info
- Publication number
- JPS50118977A JPS50118977A JP2494574A JP2494574A JPS50118977A JP S50118977 A JPS50118977 A JP S50118977A JP 2494574 A JP2494574 A JP 2494574A JP 2494574 A JP2494574 A JP 2494574A JP S50118977 A JPS50118977 A JP S50118977A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2494574A JPS50118977A (zh) | 1974-03-02 | 1974-03-02 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2494574A JPS50118977A (zh) | 1974-03-02 | 1974-03-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS50118977A true JPS50118977A (zh) | 1975-09-18 |
Family
ID=12152145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2494574A Pending JPS50118977A (zh) | 1974-03-02 | 1974-03-02 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS50118977A (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5713737A (en) * | 1980-06-27 | 1982-01-23 | Shunpei Yamazaki | Plasma vapor-phase method |
JPS584921A (ja) * | 1981-06-30 | 1983-01-12 | Fujitsu Ltd | 反応管の洗浄方法 |
JPS5821826A (ja) * | 1981-07-31 | 1983-02-08 | Seiko Epson Corp | 半導体製造装置の堆積物除去方法 |
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1974
- 1974-03-02 JP JP2494574A patent/JPS50118977A/ja active Pending
Non-Patent Citations (1)
Title |
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DENKI KAGAKU=1973 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5713737A (en) * | 1980-06-27 | 1982-01-23 | Shunpei Yamazaki | Plasma vapor-phase method |
JPS584921A (ja) * | 1981-06-30 | 1983-01-12 | Fujitsu Ltd | 反応管の洗浄方法 |
JPS5821826A (ja) * | 1981-07-31 | 1983-02-08 | Seiko Epson Corp | 半導体製造装置の堆積物除去方法 |
JPS6359533B2 (zh) * | 1981-07-31 | 1988-11-21 |