JPS5011792A - - Google Patents
Info
- Publication number
- JPS5011792A JPS5011792A JP6276173A JP6276173A JPS5011792A JP S5011792 A JPS5011792 A JP S5011792A JP 6276173 A JP6276173 A JP 6276173A JP 6276173 A JP6276173 A JP 6276173A JP S5011792 A JPS5011792 A JP S5011792A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6276173A JPS5624370B2 (de) | 1973-06-04 | 1973-06-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6276173A JPS5624370B2 (de) | 1973-06-04 | 1973-06-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5011792A true JPS5011792A (de) | 1975-02-06 |
| JPS5624370B2 JPS5624370B2 (de) | 1981-06-05 |
Family
ID=13209687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6276173A Expired JPS5624370B2 (de) | 1973-06-04 | 1973-06-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5624370B2 (de) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51147283A (en) * | 1975-06-13 | 1976-12-17 | Fujitsu Ltd | Manufacturing process of semiconductor device |
| JPS5871639A (ja) * | 1981-10-26 | 1983-04-28 | Nippon Telegr & Teleph Corp <Ntt> | 半導体集積回路の形成方法 |
| EP0055521B1 (de) * | 1980-11-29 | 1985-05-22 | Kabushiki Kaisha Toshiba | Verfahren zum Füllen einer Rille in einem Halbleitersubstrat |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6686988B2 (ja) | 2017-08-28 | 2020-04-22 | 株式会社Ｓｏｋｅｎ | 映像出力装置及び映像生成プログラム |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3386865A (en) * | 1965-05-10 | 1968-06-04 | Ibm | Process of making planar semiconductor devices isolated by encapsulating oxide filled channels |
| JPS5021229A (de) * | 1973-06-30 | 1975-03-06 | ||
| JPS5134718A (ja) * | 1974-09-18 | 1976-03-24 | Minolta Camera Kk | Goshotenkenshutsusoshi |
-
1973
- 1973-06-04 JP JP6276173A patent/JPS5624370B2/ja not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3386865A (en) * | 1965-05-10 | 1968-06-04 | Ibm | Process of making planar semiconductor devices isolated by encapsulating oxide filled channels |
| JPS5021229A (de) * | 1973-06-30 | 1975-03-06 | ||
| JPS5134718A (ja) * | 1974-09-18 | 1976-03-24 | Minolta Camera Kk | Goshotenkenshutsusoshi |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51147283A (en) * | 1975-06-13 | 1976-12-17 | Fujitsu Ltd | Manufacturing process of semiconductor device |
| EP0055521B1 (de) * | 1980-11-29 | 1985-05-22 | Kabushiki Kaisha Toshiba | Verfahren zum Füllen einer Rille in einem Halbleitersubstrat |
| JPS5871639A (ja) * | 1981-10-26 | 1983-04-28 | Nippon Telegr & Teleph Corp <Ntt> | 半導体集積回路の形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5624370B2 (de) | 1981-06-05 |