JPS50109672A - - Google Patents
Info
- Publication number
- JPS50109672A JPS50109672A JP1331274A JP1331274A JPS50109672A JP S50109672 A JPS50109672 A JP S50109672A JP 1331274 A JP1331274 A JP 1331274A JP 1331274 A JP1331274 A JP 1331274A JP S50109672 A JPS50109672 A JP S50109672A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1331274A JPS5322031B2 (https=) | 1974-02-02 | 1974-02-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1331274A JPS5322031B2 (https=) | 1974-02-02 | 1974-02-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50109672A true JPS50109672A (https=) | 1975-08-28 |
| JPS5322031B2 JPS5322031B2 (https=) | 1978-07-06 |
Family
ID=11829642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1331274A Expired JPS5322031B2 (https=) | 1974-02-02 | 1974-02-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5322031B2 (https=) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5340281A (en) * | 1976-09-27 | 1978-04-12 | Konishiroku Photo Ind Co Ltd | Photo mask material and manufacturtof it |
| JPS5672446A (en) * | 1979-11-20 | 1981-06-16 | Fujitsu Ltd | Production of photomask |
| JPS56125743A (en) * | 1980-03-07 | 1981-10-02 | Konishiroku Photo Ind Co Ltd | Base material for photomask |
| JPS58169150A (ja) * | 1982-03-30 | 1983-10-05 | Fujitsu Ltd | フオトマスクの製造方法 |
| JPS59119353A (ja) * | 1982-12-27 | 1984-07-10 | Hoya Corp | フオトマスクブランク |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2999034A (en) * | 1960-10-21 | 1961-09-05 | Wenczler & Heidenhain | Method of manufacture of line plates, scales, and the like |
| JPS493231A (https=) * | 1972-04-22 | 1974-01-12 | ||
| JPS493232A (https=) * | 1972-04-24 | 1974-01-12 |
-
1974
- 1974-02-02 JP JP1331274A patent/JPS5322031B2/ja not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2999034A (en) * | 1960-10-21 | 1961-09-05 | Wenczler & Heidenhain | Method of manufacture of line plates, scales, and the like |
| JPS493231A (https=) * | 1972-04-22 | 1974-01-12 | ||
| JPS493232A (https=) * | 1972-04-24 | 1974-01-12 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5340281A (en) * | 1976-09-27 | 1978-04-12 | Konishiroku Photo Ind Co Ltd | Photo mask material and manufacturtof it |
| JPS5672446A (en) * | 1979-11-20 | 1981-06-16 | Fujitsu Ltd | Production of photomask |
| JPS56125743A (en) * | 1980-03-07 | 1981-10-02 | Konishiroku Photo Ind Co Ltd | Base material for photomask |
| JPS58169150A (ja) * | 1982-03-30 | 1983-10-05 | Fujitsu Ltd | フオトマスクの製造方法 |
| JPS59119353A (ja) * | 1982-12-27 | 1984-07-10 | Hoya Corp | フオトマスクブランク |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5322031B2 (https=) | 1978-07-06 |