JPS50108184A - - Google Patents
Info
- Publication number
- JPS50108184A JPS50108184A JP1481874A JP1481874A JPS50108184A JP S50108184 A JPS50108184 A JP S50108184A JP 1481874 A JP1481874 A JP 1481874A JP 1481874 A JP1481874 A JP 1481874A JP S50108184 A JPS50108184 A JP S50108184A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1481874A JPS50108184A (enrdf_load_stackoverflow) | 1974-02-04 | 1974-02-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1481874A JPS50108184A (enrdf_load_stackoverflow) | 1974-02-04 | 1974-02-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50108184A true JPS50108184A (enrdf_load_stackoverflow) | 1975-08-26 |
Family
ID=11871609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1481874A Pending JPS50108184A (enrdf_load_stackoverflow) | 1974-02-04 | 1974-02-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS50108184A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52140267A (en) * | 1976-05-19 | 1977-11-22 | Nippon Telegr & Teleph Corp <Ntt> | Vapor epitaxial crystal growing device |
| JPS5399762A (en) * | 1977-02-12 | 1978-08-31 | Futaba Denshi Kogyo Kk | Device for producing compound semiconductor film |
| JPS57161060A (en) * | 1981-03-30 | 1982-10-04 | Inoue Japax Res Inc | Ion working device |
| JPS5897825A (ja) * | 1981-12-07 | 1983-06-10 | Seiko Epson Corp | イオン.ビ−ム.デポジシヨン法 |
| JPS62229844A (ja) * | 1986-03-31 | 1987-10-08 | Toshiba Corp | 薄膜堆積方法 |
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1974
- 1974-02-04 JP JP1481874A patent/JPS50108184A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52140267A (en) * | 1976-05-19 | 1977-11-22 | Nippon Telegr & Teleph Corp <Ntt> | Vapor epitaxial crystal growing device |
| JPS5399762A (en) * | 1977-02-12 | 1978-08-31 | Futaba Denshi Kogyo Kk | Device for producing compound semiconductor film |
| JPS57161060A (en) * | 1981-03-30 | 1982-10-04 | Inoue Japax Res Inc | Ion working device |
| JPS5897825A (ja) * | 1981-12-07 | 1983-06-10 | Seiko Epson Corp | イオン.ビ−ム.デポジシヨン法 |
| JPS62229844A (ja) * | 1986-03-31 | 1987-10-08 | Toshiba Corp | 薄膜堆積方法 |