JPS5010734A - - Google Patents
Info
- Publication number
- JPS5010734A JPS5010734A JP6197673A JP6197673A JPS5010734A JP S5010734 A JPS5010734 A JP S5010734A JP 6197673 A JP6197673 A JP 6197673A JP 6197673 A JP6197673 A JP 6197673A JP S5010734 A JPS5010734 A JP S5010734A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemically Coating (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6197673A JPS5010734A (xx) | 1973-06-04 | 1973-06-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6197673A JPS5010734A (xx) | 1973-06-04 | 1973-06-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5010734A true JPS5010734A (xx) | 1975-02-04 |
Family
ID=13186707
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6197673A Pending JPS5010734A (xx) | 1973-06-04 | 1973-06-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5010734A (xx) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5262026A (en) * | 1975-11-17 | 1977-05-23 | Toray Industries | Method of transferring continuous recording medium for electrophotographic recording practice |
| JPS62132345A (ja) * | 1985-12-04 | 1987-06-15 | Mitsubishi Electric Corp | 半導体装置 |
| JP2006206985A (ja) * | 2005-01-31 | 2006-08-10 | C Uyemura & Co Ltd | 無電解ニッケル−リンめっき皮膜及び無電解ニッケル−リンめっき浴 |
| JP2014181373A (ja) * | 2013-03-19 | 2014-09-29 | Jx Nippon Mining & Metals Corp | Ｎｉ及びＮｉ合金膜が形成されたシリコンウエハ、Ｓｉウエハ上へのＮｉ及びＮｉ合金膜の形成方法、Ｎｉ及びＮｉ合金膜を形成する際のＳｉウエハの表面の表面粗化処理液及び同表面粗化処理方法 |
-
1973
- 1973-06-04 JP JP6197673A patent/JPS5010734A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5262026A (en) * | 1975-11-17 | 1977-05-23 | Toray Industries | Method of transferring continuous recording medium for electrophotographic recording practice |
| JPS5510910B2 (xx) * | 1975-11-17 | 1980-03-19 | ||
| JPS62132345A (ja) * | 1985-12-04 | 1987-06-15 | Mitsubishi Electric Corp | 半導体装置 |
| JP2006206985A (ja) * | 2005-01-31 | 2006-08-10 | C Uyemura & Co Ltd | 無電解ニッケル−リンめっき皮膜及び無電解ニッケル−リンめっき浴 |
| JP2014181373A (ja) * | 2013-03-19 | 2014-09-29 | Jx Nippon Mining & Metals Corp | Ｎｉ及びＮｉ合金膜が形成されたシリコンウエハ、Ｓｉウエハ上へのＮｉ及びＮｉ合金膜の形成方法、Ｎｉ及びＮｉ合金膜を形成する際のＳｉウエハの表面の表面粗化処理液及び同表面粗化処理方法 |