JPS50104143A - - Google Patents

Info

Publication number
JPS50104143A
JPS50104143A JP987674A JP987674A JPS50104143A JP S50104143 A JPS50104143 A JP S50104143A JP 987674 A JP987674 A JP 987674A JP 987674 A JP987674 A JP 987674A JP S50104143 A JPS50104143 A JP S50104143A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP987674A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP987674A priority Critical patent/JPS50104143A/ja
Publication of JPS50104143A publication Critical patent/JPS50104143A/ja
Pending legal-status Critical Current

Links

JP987674A 1974-01-23 1974-01-23 Pending JPS50104143A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP987674A JPS50104143A (ja) 1974-01-23 1974-01-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP987674A JPS50104143A (ja) 1974-01-23 1974-01-23

Publications (1)

Publication Number Publication Date
JPS50104143A true JPS50104143A (ja) 1975-08-16

Family

ID=11732342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP987674A Pending JPS50104143A (ja) 1974-01-23 1974-01-23

Country Status (1)

Country Link
JP (1) JPS50104143A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03150392A (ja) * 1989-09-05 1991-06-26 General Electric Co <Ge> 金属被覆ポリイミド複合物の調製方法
WO2001053569A1 (en) * 2000-01-20 2001-07-26 Nikko Materials Company, Limited Copper electroplating liquid, pretreatment liquid for copper electroplating and method of copper electroplating
JP2004162172A (ja) * 2002-11-14 2004-06-10 Iljin Copper Foil Co Ltd 電解銅箔製造用の電解液及びそれを用いた電解銅箔の製造方法
WO2006129886A1 (en) * 2005-06-03 2006-12-07 Fujifilm Corporation Plating method, electrically conductive film and light-transmitting electromagnetic wave shielding film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2039831A1 (de) * 1970-06-06 1972-01-05 Schering Ag Saurer Elektrolyt zur Abscheidung glaenzender Kupferueberzuege

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2039831A1 (de) * 1970-06-06 1972-01-05 Schering Ag Saurer Elektrolyt zur Abscheidung glaenzender Kupferueberzuege
US3743584A (en) * 1970-06-06 1973-07-03 Schering Ag Acid bright copper plating bath

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03150392A (ja) * 1989-09-05 1991-06-26 General Electric Co <Ge> 金属被覆ポリイミド複合物の調製方法
WO2001053569A1 (en) * 2000-01-20 2001-07-26 Nikko Materials Company, Limited Copper electroplating liquid, pretreatment liquid for copper electroplating and method of copper electroplating
JP2004162172A (ja) * 2002-11-14 2004-06-10 Iljin Copper Foil Co Ltd 電解銅箔製造用の電解液及びそれを用いた電解銅箔の製造方法
WO2006129886A1 (en) * 2005-06-03 2006-12-07 Fujifilm Corporation Plating method, electrically conductive film and light-transmitting electromagnetic wave shielding film

Similar Documents

Publication Publication Date Title
FR2283314B1 (ja)
AR199089A1 (ja)
AU7474374A (ja)
CH575537A5 (ja)
AU480170A (ja)
BG19607A1 (ja)
BG20018A1 (ja)
BG20186A1 (ja)
BG20662A1 (ja)
BG20665A1 (ja)
BG20670A1 (ja)
BG20724A1 (ja)
BG20849A1 (ja)
BG21661A1 (ja)
BG21791A1 (ja)
BG22011A1 (ja)
BG22387A3 (ja)
BG22667A1 (ja)
BG26192A3 (ja)
BG26358A3 (ja)
BG26402A3 (ja)
BG27047A4 (ja)
BG27089A3 (ja)
CH1637174A4 (ja)
CH352875A4 (ja)