JPS4997690A - - Google Patents

Info

Publication number
JPS4997690A
JPS4997690A JP48007911A JP791173A JPS4997690A JP S4997690 A JPS4997690 A JP S4997690A JP 48007911 A JP48007911 A JP 48007911A JP 791173 A JP791173 A JP 791173A JP S4997690 A JPS4997690 A JP S4997690A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP48007911A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP48007911A priority Critical patent/JPS4997690A/ja
Priority to US434061A priority patent/US3930155A/en
Publication of JPS4997690A publication Critical patent/JPS4997690A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
JP48007911A 1973-01-19 1973-01-19 Pending JPS4997690A (enrdf_load_stackoverflow)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP48007911A JPS4997690A (enrdf_load_stackoverflow) 1973-01-19 1973-01-19
US434061A US3930155A (en) 1973-01-19 1974-01-17 Ion microprobe analyser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48007911A JPS4997690A (enrdf_load_stackoverflow) 1973-01-19 1973-01-19

Publications (1)

Publication Number Publication Date
JPS4997690A true JPS4997690A (enrdf_load_stackoverflow) 1974-09-14

Family

ID=11678713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48007911A Pending JPS4997690A (enrdf_load_stackoverflow) 1973-01-19 1973-01-19

Country Status (1)

Country Link
JP (1) JPS4997690A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6119043A (ja) * 1984-07-06 1986-01-27 Nippon Telegr & Teleph Corp <Ntt> 二次イオン質量分析装置
JPS6286657A (ja) * 1985-10-11 1987-04-21 Hitachi Ltd 二次イオン質量分析計用イオン源
JPS63170940A (ja) * 1987-12-02 1988-07-14 Hitachi Ltd Ｉｃ素子の修正方法
JPS63296241A (ja) * 1987-12-02 1988-12-02 Hitachi Ltd Ｉｃ素子の加工装置
JPS63301952A (ja) * 1986-12-26 1988-12-08 Seiko Instr & Electronics Ltd イオンビーム加工方法およびその装置
US5071671A (en) * 1984-02-28 1991-12-10 Seiko Instruments Inc. Process for forming pattern films

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5071671A (en) * 1984-02-28 1991-12-10 Seiko Instruments Inc. Process for forming pattern films
JPS6119043A (ja) * 1984-07-06 1986-01-27 Nippon Telegr & Teleph Corp <Ntt> 二次イオン質量分析装置
JPS6286657A (ja) * 1985-10-11 1987-04-21 Hitachi Ltd 二次イオン質量分析計用イオン源
JPS63301952A (ja) * 1986-12-26 1988-12-08 Seiko Instr & Electronics Ltd イオンビーム加工方法およびその装置
JPS63170940A (ja) * 1987-12-02 1988-07-14 Hitachi Ltd Ｉｃ素子の修正方法
JPS63296241A (ja) * 1987-12-02 1988-12-02 Hitachi Ltd Ｉｃ素子の加工装置

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