JPS4988606A - - Google Patents
Info
- Publication number
- JPS4988606A JPS4988606A JP365773A JP365773A JPS4988606A JP S4988606 A JPS4988606 A JP S4988606A JP 365773 A JP365773 A JP 365773A JP 365773 A JP365773 A JP 365773A JP S4988606 A JPS4988606 A JP S4988606A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polyamides (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP365773A JPS5032647B2 (cg-RX-API-DMAC7.html) | 1972-12-28 | 1972-12-28 | |
| DE2364873A DE2364873A1 (de) | 1972-12-28 | 1973-12-28 | Lichtempfindliche harzzusammensetzung und diese enthaltendes druckplattenmaterial |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP365773A JPS5032647B2 (cg-RX-API-DMAC7.html) | 1972-12-28 | 1972-12-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4988606A true JPS4988606A (cg-RX-API-DMAC7.html) | 1974-08-24 |
| JPS5032647B2 JPS5032647B2 (cg-RX-API-DMAC7.html) | 1975-10-23 |
Family
ID=11563526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP365773A Expired JPS5032647B2 (cg-RX-API-DMAC7.html) | 1972-12-28 | 1972-12-28 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5032647B2 (cg-RX-API-DMAC7.html) |
| DE (1) | DE2364873A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2942183A1 (de) | 1979-10-18 | 1981-05-07 | Basf Ag, 6700 Ludwigshafen | Fotopolymerisierbare gemische und elemente daraus |
| EP0273113B1 (en) * | 1986-12-26 | 1991-01-23 | Toray Industries, Inc. | Photosensitive polymer composition and master printing plate |
| DE4202332A1 (de) * | 1992-01-29 | 1993-08-05 | Basf Lacke & Farben | Lichtempfindliches gemisch zur herstellung von relief- und druckformen |
| JP3510393B2 (ja) | 1994-08-10 | 2004-03-29 | シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー | 光硬化性エラストマー組成物から得られるフレキソグラフ印刷プレート |
-
1972
- 1972-12-28 JP JP365773A patent/JPS5032647B2/ja not_active Expired
-
1973
- 1973-12-28 DE DE2364873A patent/DE2364873A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5032647B2 (cg-RX-API-DMAC7.html) | 1975-10-23 |
| DE2364873A1 (de) | 1974-08-08 |