JPS497993B1 - - Google Patents
Info
- Publication number
- JPS497993B1 JPS497993B1 JP8523569A JP8523569A JPS497993B1 JP S497993 B1 JPS497993 B1 JP S497993B1 JP 8523569 A JP8523569 A JP 8523569A JP 8523569 A JP8523569 A JP 8523569A JP S497993 B1 JPS497993 B1 JP S497993B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8523569A JPS497993B1 (en) | 1969-10-27 | 1969-10-27 | |
GB5106370A GB1308790A (en) | 1969-10-27 | 1970-10-27 | Method of producing a vapour growth layer of gaas1-xpx |
NL7015756A NL151911B (en) | 1969-10-27 | 1970-10-27 | PROCESS FOR GROWING EPITAXIAL, VAPOR PHASE REACTION, OF AN OTHERS DOSED GAAS1- * P * LAYER ON AN UNDERLAY AND PREPARED PRODUCTION OBTAINED BY THE APPLICATION OF THIS PROCEDURE. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8523569A JPS497993B1 (en) | 1969-10-27 | 1969-10-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS497993B1 true JPS497993B1 (en) | 1974-02-23 |
Family
ID=13852884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8523569A Pending JPS497993B1 (en) | 1969-10-27 | 1969-10-27 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS497993B1 (en) |
GB (1) | GB1308790A (en) |
NL (1) | NL151911B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01123133A (en) * | 1987-11-09 | 1989-05-16 | Hitachi Ltd | Spectrophotometer |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4633893A (en) * | 1984-05-21 | 1987-01-06 | Cfm Technologies Limited Partnership | Apparatus for treating semiconductor wafers |
US4577650A (en) * | 1984-05-21 | 1986-03-25 | Mcconnell Christopher F | Vessel and system for treating wafers with fluids |
US4740249A (en) * | 1984-05-21 | 1988-04-26 | Christopher F. McConnell | Method of treating wafers with fluid |
US4856544A (en) * | 1984-05-21 | 1989-08-15 | Cfm Technologies, Inc. | Vessel and system for treating wafers with fluids |
US4738272A (en) * | 1984-05-21 | 1988-04-19 | Mcconnell Christopher F | Vessel and system for treating wafers with fluids |
AU6327398A (en) * | 1997-02-18 | 1998-09-08 | Scp Global Technologies | Multiple stage wet processing chamber |
-
1969
- 1969-10-27 JP JP8523569A patent/JPS497993B1/ja active Pending
-
1970
- 1970-10-27 NL NL7015756A patent/NL151911B/en unknown
- 1970-10-27 GB GB5106370A patent/GB1308790A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01123133A (en) * | 1987-11-09 | 1989-05-16 | Hitachi Ltd | Spectrophotometer |
Also Published As
Publication number | Publication date |
---|---|
GB1308790A (en) | 1973-03-07 |
NL151911B (en) | 1977-01-17 |
NL7015756A (en) | 1971-04-29 |